Doping-based stabilization of the M2 phase in free-standing VO2 nanostructures at room temperature

Evgheni Strelcov, Alexander Tselev, Ilia Ivanov, John D. Budai, Jie Zhang, Jonathan Z. Tischler, Ivan Kravchenko, Sergei V. Kalinin, Andrei Kolmakov

Research output: Contribution to journalArticlepeer-review

151 Scopus citations

Abstract

A new high-yield method of doping VO2 nanostructures with aluminum is proposed, which renders possible stabilization of the monoclinic M2 phase in free-standing nanoplatelets in ambient conditions and opens an opportunity for realization of a purely electronic Mott transition field-effect transistor without an accompanying structural transition. The synthesized free-standing M2-phase nanostructures are shown to have very high crystallinity and an extremely sharp temperature-driven metal-insulator transition. A combination of X-ray microdiffraction, micro-Raman spectroscopy, energy-dispersive X-ray spectroscopy, and four-probe electrical measurements allowed thorough characterization of the doped nanostructures. Light is shed onto some aspects of the nanostructure growth, and the temperature-doping level phase diagram is established.

Original languageEnglish
Pages (from-to)6198-6205
Number of pages8
JournalNano Letters
Volume12
Issue number12
DOIs
StatePublished - Dec 12 2012

Keywords

  • Al
  • M2 phase
  • Mott transition FET
  • Vanadium dioxide
  • doping

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