Domain wall motion in epitaxial Pb (Zr,Ti)O3 capacitors investigated by modified piezoresponse force microscopy

S. M. Yang, J. Y. Jo, D. J. Kim, H. Sung, T. W. Noh, H. N. Lee, J. G. Yoon, T. K. Song

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Abstract

We investigated the time-dependent domain wall motion of epitaxial Pb Zr0.2Ti0.8O3 capacitors 100 nm thick using modified piezoresponse force microscopy (PFM). We obtained successive domain evolution images reliably by combining the PFM with switching current measurements. We observed that domain wall speed (v) decreases with increases in domain size. We also observed that the average value of v, obtained under applied electric field (Eapp), showed creep behavior, i.e., 〈v〉 ∼exp[- (E0 Eapp)μ] with an exponent μ of 0.9±0.1 and an activation field E0 of about 700 kVcm.

Original languageEnglish
Article number252901
JournalApplied Physics Letters
Volume92
Issue number25
DOIs
StatePublished - 2008

Funding

This study was financially supported by the Creative Research Initiative program (Functionally Integrated Oxide Heterostructure) of MOST/KOSEF. S.M.Y. acknowledges financial support, in part, from the Seoul Science Scholarship. H.N.L. was supported by the LDRD program of ORNL.

FundersFunder number
MOST/KOSEF
Seoul Science Scholarship
Oak Ridge National Laboratory
Laboratory Directed Research and Development

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