Domain structure control of BiFeO3 films through substrate symmetry and film thickness

C. T. Nelson; Y. Zhang; C. M. Folkman; C. B. Eom; J. F. Mansfield; X. Q. Pan

doi:10.1017/S1431927609099450

Domain structure control of BiFeO₃ films through substrate symmetry and film thickness

C. T. Nelson, Y. Zhang, C. M. Folkman, C. B. Eom, J. F. Mansfield, X. Q. Pan

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Original language	English
Pages (from-to)	1030-1031
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	15
Issue number	SUPPL. 2
DOIs	https://doi.org/10.1017/S1431927609099450
State	Published - Jul 2009
Externally published	Yes

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title = "Domain structure control of BiFeO3 films through substrate symmetry and film thickness",

author = "Nelson, {C. T.} and Y. Zhang and Folkman, {C. M.} and Eom, {C. B.} and Mansfield, {J. F.} and Pan, {X. Q.}",

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language = "English",

volume = "15",

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AU - Nelson, C. T.

AU - Zhang, Y.

AU - Folkman, C. M.

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AU - Mansfield, J. F.

AU - Pan, X. Q.

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JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - SUPPL. 2

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Domain structure control of BiFeO3 films through substrate symmetry and film thickness

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Domain structure control of BiFeO₃ films through substrate symmetry and film thickness