Distinctive features of structural evolution and thermodynamic response in wide-bandgap semiconductors driven by intense electronic excitation

Xinqing Han, Yong Liu, Eva Zarkadoula, Miguel L. Crespillo, Wenxiang Mu, Peng Liu

Research output: Contribution to journalArticlepeer-review

Abstract

Radiation-tolerant material selection requires balancing lattice rigidity, defect dynamics, and electronic stability, as shown by covalent SiC outperforming ionic Ga2O3 and GaN under extreme environments. Responding to intense electronic excitation, irradiation-driven phase segregation (β → δ/κ in Ga2O3) and core–shell track (disordered structure in GaN), accompanied by elemental redistribution, contrastingly, exceptional radiation tolerance manifested by comparatively minimal lattice distortion (0.17 % strain variation) was demonstrated in SiC. These differential responses are primarily attributed to two fundamental mechanisms: (i) thermodynamic driving forces governing defect migration and phase separation, and (ii) the synergistic effects of robust covalent bonding composition coupled with efficient defect recombination processes. The stronger electron–phonon (e-ph) coupling in Ga2O3 (4.34 × 1018 W m−3 K−1) and GaN (3.55 × 1018 W m−3 K−1) enhances lattice energy deposition, triggering thermal spikes (ΔT ≫ Tm) and structural transition behaviors, whereas weaker e-ph coupling in SiC (3.69 × 1018 W m−3 K−1), relatively high thermodynamic parameters and efficient energy dissipation suppress thermal spikes to maintaining lattice integrity. The photoresponse degradation driven by enhanced radiative recombination is dominant in N-doped SiC, while V-doped systems achieve defect-mediated photoconduction optimization characterized by abrupt current transitions, matching fluorescence yield evolutions, and directly connecting defect engineering to optoelectronic performance.

Original languageEnglish
Article number164873
JournalApplied Surface Science
Volume718
DOIs
StatePublished - Feb 15 2026

Funding

The works were supported by the National Natural Science Foundation of China (NSFC), China (No. 12322514, 12405313), the Shandong Natural Science Foundation, China (No. ZR2024QA055), and the National Laboratory of Heavy Ion Accelerator in Lanzhou, China. EZ was supported by the Center for Nanophase Materials Sciences (CNMS), which is a US Department of Energy, Office of Science, United States. User Facility at Oak Ridge National Laboratory, United States.

Keywords

  • Intense electronic excitation
  • Irradiation damage behavior
  • Optical/optoelectronic performance
  • Thermodynamic response mechanism
  • Wide bandgap semiconductor

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