Directed assembly of carbon nanotube electronic circuits by selective area chemical vapor deposition on prepatterned catalyst electrode structures

Y. Y. Wei; X. Fan; Gyula Eres

doi:10.1116/1.1319709

Directed assembly of carbon nanotube electronic circuits by selective area chemical vapor deposition on prepatterned catalyst electrode structures

Y. Y. Wei, X. Fan, Gyula Eres

Research output: Contribution to journal › Conference article › peer-review

7 Scopus citations

Abstract

A method for the direct assembly of carbon nanotube (CNT) electronic circuits was presented. Fe thin film electrode structures were patterned on silicon dioxide covered Si wafers by electron-beam lithography. Chemical vapor deposition was performed with the Fe thin film acting as the catalyst. Transmission electron microscopy (TEM) imaging showed that CNTs were multiwalled and grew only on the catalyst film. They eventually bridged the micron size electrode gap and formed the CNT electronic circuits.

Original language	English
Pages (from-to)	3586-3589
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	18
Issue number	6
DOIs	https://doi.org/10.1116/1.1319709
State	Published - Nov 2000
Event	44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA Duration: May 30 2000 → Jun 2 2000

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10.1116/1.1319709

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@article{27a87322507e4cdb8205235e6c6ee94e,

title = "Directed assembly of carbon nanotube electronic circuits by selective area chemical vapor deposition on prepatterned catalyst electrode structures",

abstract = "A method for the direct assembly of carbon nanotube (CNT) electronic circuits was presented. Fe thin film electrode structures were patterned on silicon dioxide covered Si wafers by electron-beam lithography. Chemical vapor deposition was performed with the Fe thin film acting as the catalyst. Transmission electron microscopy (TEM) imaging showed that CNTs were multiwalled and grew only on the catalyst film. They eventually bridged the micron size electrode gap and formed the CNT electronic circuits.",

author = "Wei, {Y. Y.} and X. Fan and Gyula Eres",

year = "2000",

month = nov,

doi = "10.1116/1.1319709",

language = "English",

volume = "18",

pages = "3586--3589",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

number = "6",

note = "44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication ; Conference date: 30-05-2000 Through 02-06-2000",

}

Directed assembly of carbon nanotube electronic circuits by selective area chemical vapor deposition on prepatterned catalyst electrode structures. / Wei, Y. Y.; Fan, X.; Eres, Gyula.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 18, No. 6, 11.2000, p. 3586-3589.

Research output: Contribution to journal › Conference article › peer-review

TY - JOUR

T1 - Directed assembly of carbon nanotube electronic circuits by selective area chemical vapor deposition on prepatterned catalyst electrode structures

AU - Wei, Y. Y.

AU - Fan, X.

AU - Eres, Gyula

PY - 2000/11

Y1 - 2000/11

N2 - A method for the direct assembly of carbon nanotube (CNT) electronic circuits was presented. Fe thin film electrode structures were patterned on silicon dioxide covered Si wafers by electron-beam lithography. Chemical vapor deposition was performed with the Fe thin film acting as the catalyst. Transmission electron microscopy (TEM) imaging showed that CNTs were multiwalled and grew only on the catalyst film. They eventually bridged the micron size electrode gap and formed the CNT electronic circuits.

AB - A method for the direct assembly of carbon nanotube (CNT) electronic circuits was presented. Fe thin film electrode structures were patterned on silicon dioxide covered Si wafers by electron-beam lithography. Chemical vapor deposition was performed with the Fe thin film acting as the catalyst. Transmission electron microscopy (TEM) imaging showed that CNTs were multiwalled and grew only on the catalyst film. They eventually bridged the micron size electrode gap and formed the CNT electronic circuits.

UR - http://www.scopus.com/inward/record.url?scp=0034317875&partnerID=8YFLogxK

U2 - 10.1116/1.1319709

DO - 10.1116/1.1319709

M3 - Conference article

AN - SCOPUS:0034317875

SN - 1071-1023

VL - 18

SP - 3586

EP - 3589

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

T2 - 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Y2 - 30 May 2000 through 2 June 2000

ER -

Directed assembly of carbon nanotube electronic circuits by selective area chemical vapor deposition on prepatterned catalyst electrode structures

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