Direct write of 3D nanoscale mesh objects with platinum precursor via focused helium ion beam induced deposition

Alex Belianinov; Matthew J. Burch; Anton Ievlev; Songkil Kim; Michael G. Stanford; Kyle Mahady; Brett B. Lewis; Jason D. Fowlkes; Philip D. Rack; Olga S. Ovchinnikova

doi:10.3390/mi11050527

Direct write of 3D nanoscale mesh objects with platinum precursor via focused helium ion beam induced deposition

Alex Belianinov, Matthew J. Burch, Anton Ievlev, Songkil Kim, Michael G. Stanford, Kyle Mahady, Brett B. Lewis, Jason D. Fowlkes, Philip D. Rack, Olga S. Ovchinnikova

Functional Atomic Force Microscopy Group

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

The next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic precursor gas to fabricate nanoscale structures in 3D with high-precision and smaller critical dimensions than focused electron beam induced deposition (FEBID), traditional liquid metal source FIBID, or other additive manufacturing technology. In this work, we report the effect of beam current, dwell time, and pixel pitch on the resultant segment and angle growth for nanoscale 3D mesh objects. We note subtle beam heating effects, which impact the segment angle and the feature size. Additionally, we investigate the competition of material deposition and sputtering during the 3D FIBID process, with helium ion microscopy experiments and Monte Carlo simulations. Our results show complex 3D mesh structures measuring ~300 nm in the largest dimension, with individual features as small as 16 nm at full width half maximum (FWHM). These assemblies can be completed in minutes, with the underlying fabrication technology compatible with existing lithographic techniques, suggesting a higher-throughput pathway to integrating FIBID with established nanofabrication techniques.

Original language	English
Article number	527
Journal	Micromachines
Volume	11
Issue number	5
DOIs	https://doi.org/10.3390/mi11050527
State	Published - May 1 2020

Funding

In conclusion, we demonstrate a novel method to grow platinum rich 3D structures atop a wide In conclusion, we demonstrate a novel method to grow platinum rich 3D structures atop a wide variety of substrates using a FIBID process in a helium ion microscope. Our workflow allows the users to rapidly optimize the experimental conditions for processing parameters using advanced data analytics. Three-dimensional calibration curves of the segment angle versus dwell time and pitch reveal the two variables converge to a single variable, the DTPLP. Slight deviations at DTPLP and high current suggest beam heating effects are operative in some conditions. Analysis of the segment width over a variety of patterning conditions can be understood by beam heating effects which lower the precursor coverage in the beam growth region. We illustrate this approach for fabricating complex 3D submicron architectures with minimum features measuring 16 nm, at FWHM. Future work will focus on detailed investigation of the beam heating phenomena and correlating the purity and electrical properties for different growth regimes and a wider variety of precursors. Author Contributions: Project was conceived by, A.B., P.D.R. and O.S.O.; HIM data collection, A.B., M.J.B., S.K., M.G.S., and B.B.L.; CAD software, J.D.F.; Monte Carlo simulations, K.M.; Python data analysis code, A.I.; Mal.lGa.Su.t,h aonrds cBo.Bn.tLri.b; uCtAedD tshoeftwwrairtein, gJ.Dan.Fd.; eMdiotninteg Cofartlhoe smimaunluasticornipst, .KA.Mll..a;uPtyhtohrosnhdaavtea raenaadlyasnisd caogdree,e Ad .tIo.; tahlle authors contributed the writing and editing of the manuscript. All authors have read and agreed to the published Funding: This research was conducted at the Center for Nanophase Materials Sciences, which is a DOE Office of Science User Facility. MGS acknowledges support from the U.S. Department of Energy (DOE) under Grant Funding: This research was conducted at the Center for Nanophase Materials Sciences, which is a DOE Office of Science User Facility. MGS acknowledges support from the U.S. Department of Energy (DOE) under Grant Conflicts of Interest: The authors declare no conflict of interest. This research was conducted at the Center for Nanophase Materials Sciences, which is a DOE Oce of Science User Facility. MGS acknowledges support from the U.S. Department of Energy (DOE) under Grant No. DE-SC0002136.

Funders	Funder number
DOE Office of Science
U.S. Department of Energy	DE-SC0002136

Keywords

3D nano-printing
Direct-write nanofabrication
Focused ion beam induced deposition
Helium ion microscopy

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.3390/mi11050527

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title = "Direct write of 3D nanoscale mesh objects with platinum precursor via focused helium ion beam induced deposition",

abstract = "The next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic precursor gas to fabricate nanoscale structures in 3D with high-precision and smaller critical dimensions than focused electron beam induced deposition (FEBID), traditional liquid metal source FIBID, or other additive manufacturing technology. In this work, we report the effect of beam current, dwell time, and pixel pitch on the resultant segment and angle growth for nanoscale 3D mesh objects. We note subtle beam heating effects, which impact the segment angle and the feature size. Additionally, we investigate the competition of material deposition and sputtering during the 3D FIBID process, with helium ion microscopy experiments and Monte Carlo simulations. Our results show complex 3D mesh structures measuring ~300 nm in the largest dimension, with individual features as small as 16 nm at full width half maximum (FWHM). These assemblies can be completed in minutes, with the underlying fabrication technology compatible with existing lithographic techniques, suggesting a higher-throughput pathway to integrating FIBID with established nanofabrication techniques.",

keywords = "3D nano-printing, Direct-write nanofabrication, Focused ion beam induced deposition, Helium ion microscopy",

author = "Alex Belianinov and Burch, {Matthew J.} and Anton Ievlev and Songkil Kim and Stanford, {Michael G.} and Kyle Mahady and Lewis, {Brett B.} and Fowlkes, {Jason D.} and Rack, {Philip D.} and Ovchinnikova, {Olga S.}",

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AU - Belianinov, Alex

AU - Burch, Matthew J.

AU - Ievlev, Anton

AU - Kim, Songkil

AU - Stanford, Michael G.

AU - Mahady, Kyle

AU - Lewis, Brett B.

AU - Fowlkes, Jason D.

AU - Rack, Philip D.

AU - Ovchinnikova, Olga S.

PY - 2020/5/1

Y1 - 2020/5/1

N2 - The next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic precursor gas to fabricate nanoscale structures in 3D with high-precision and smaller critical dimensions than focused electron beam induced deposition (FEBID), traditional liquid metal source FIBID, or other additive manufacturing technology. In this work, we report the effect of beam current, dwell time, and pixel pitch on the resultant segment and angle growth for nanoscale 3D mesh objects. We note subtle beam heating effects, which impact the segment angle and the feature size. Additionally, we investigate the competition of material deposition and sputtering during the 3D FIBID process, with helium ion microscopy experiments and Monte Carlo simulations. Our results show complex 3D mesh structures measuring ~300 nm in the largest dimension, with individual features as small as 16 nm at full width half maximum (FWHM). These assemblies can be completed in minutes, with the underlying fabrication technology compatible with existing lithographic techniques, suggesting a higher-throughput pathway to integrating FIBID with established nanofabrication techniques.

AB - The next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic precursor gas to fabricate nanoscale structures in 3D with high-precision and smaller critical dimensions than focused electron beam induced deposition (FEBID), traditional liquid metal source FIBID, or other additive manufacturing technology. In this work, we report the effect of beam current, dwell time, and pixel pitch on the resultant segment and angle growth for nanoscale 3D mesh objects. We note subtle beam heating effects, which impact the segment angle and the feature size. Additionally, we investigate the competition of material deposition and sputtering during the 3D FIBID process, with helium ion microscopy experiments and Monte Carlo simulations. Our results show complex 3D mesh structures measuring ~300 nm in the largest dimension, with individual features as small as 16 nm at full width half maximum (FWHM). These assemblies can be completed in minutes, with the underlying fabrication technology compatible with existing lithographic techniques, suggesting a higher-throughput pathway to integrating FIBID with established nanofabrication techniques.

KW - 3D nano-printing

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Direct write of 3D nanoscale mesh objects with platinum precursor via focused helium ion beam induced deposition

Abstract

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Keywords

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