Abstract
Inspired by biological neuromorphic computing, artificial neural networks based on crossbar arrays of bilayer tantalum oxide memristors have shown to be promising alternatives to conventional complementary metal-oxide-semiconductor (CMOS) architectures. In order to understand the driving mechanism in these oxide systems, tantalum oxide films are resistively switched by conductive atomic force microscopy (C-AFM), and subsequently imaged by kelvin probe force microscopy (KPFM) and spatially resolved time-of-flight secondary ion mass spectrometry (ToF-SIMS). These workflows enable induction and analysis of the resistive switching mechanism as well as control over the resistively switched region of the film. In this work it is shown that the resistive switching mechanism is driven by both current and electric field effects. Reversible oxygen motion is enabled by applying low (<1 V) electric fields, while high electric fields generate irreversible breakdown of the material (>1 V). Fully understanding oxygen motion and electrical effects in bilayer oxide memristor systems is a fundamental step toward the adoption of memristors as a neuromorphic computing technology.
Original language | English |
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Article number | 2300589 |
Journal | Advanced Electronic Materials |
Volume | 10 |
Issue number | 1 |
DOIs | |
State | Published - Jan 2024 |
Externally published | Yes |
Funding
This research was funded by the DOE Office of Science Research Program for Microelectronics Codesign (sponsored by ASCR, BES, HEP, NP, and FES) through the Abisko Project with program managers Robinson Pino (ASCR). Hal Finkel (ASCR), and Andrew Schwartz (BES). C-AFM, KPFM, ToF-SIMS and DFT calculations were conducted at the Center for Nanophase Materials Sciences (CNMS), which was a US Department of Energy, Office of Science User Facility at Oak Ridge National Laboratory ORNL and Sandia. This manuscript has been authored by UT-Battelle, LLC, under contract DE-AC05-00OR22725 with the US Department of Energy (DOE). The US government retains and the publisher, by accepting this article for publication, acknowledges that the US government retains a nonexclusive, paid-up, irrevocable, worldwide licence to publish or reproduce the published form of this manuscript, or allow others to do so, for US government purposes. DOE will provide public access to these results of federally sponcered research in accordance with the DOE Public Access Plan (https://www.energy.gov/doe-public-access-plan). Sandia National Laboratories is managed and operated by National Technology and Engineering Solutions of Sandia, LLC., a wholly owned subsidiary of Honeywell International, Inc., for the U.S. Department of Energy's National Nuclear Security Administration under Contract DE-NA-0003525. This research was funded by the DOE Office of Science Research Program for Microelectronics Codesign (sponsored by ASCR, BES, HEP, NP, and FES) through the Abisko Project with program managers Robinson Pino (ASCR). Hal Finkel (ASCR), and Andrew Schwartz (BES). C‐AFM, KPFM, ToF‐SIMS and DFT calculations were conducted at the Center for Nanophase Materials Sciences (CNMS), which was a US Department of Energy, Office of Science User Facility at Oak Ridge National Laboratory ORNL and Sandia. This manuscript has been authored by UT‐Battelle, LLC, under contract DE‐AC05‐00OR22725 with the US Department of Energy (DOE). The US government retains and the publisher, by accepting this article for publication, acknowledges that the US government retains a nonexclusive, paid‐up, irrevocable, worldwide licence to publish or reproduce the published form of this manuscript, or allow others to do so, for US government purposes. DOE will provide public access to these results of federally sponcered research in accordance with the DOE Public Access Plan (https://www.energy.gov/doe‐public‐access‐plan). Sandia National Laboratories is managed and operated by National Technology and Engineering Solutions of Sandia, LLC., a wholly owned subsidiary of Honeywell International, Inc., for the U.S. Department of Energy's National Nuclear Security Administration under Contract DE‐NA‐0003525.
Funders | Funder number |
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Andrew Schwartz | |
DOE Office of Science Research Program for Microelectronics Codesign | |
DOE Public Access Plan | |
U.S. Department of Energy | |
Office of Science | |
Basic Energy Sciences | |
National Nuclear Security Administration | DE‐NA‐0003525 |
Advanced Scientific Computing Research | |
Oak Ridge National Laboratory | DE-AC05-00OR22725 |
Higher Education Press | DE‐AC05‐00OR22725 |
Keywords
- ReRAM
- memristors
- tantalum oxide