Direct to digital holography for semiconductor wafer defect detection and review

C. E. Thomas; Tracy M. Bahm; Larry R. Baylor; Philip R. Bingham; Steven W. Burns; Matthew D. Chidley; Xiaolong Dai; Robert J. Delahanty; Christopher J. Doti; Ayman El-Khashab; Robert L. Fisher; Judd M. Gilbert; James S. Goddard; Gregory R. Hanson; Joel D. Hickson; Martin A. Hunt; Kathy W. Hylton; George C. John; Michael L. Jones; Kenneth R. MacDonald; Michael W. Mayo; Ian McMackin; David R. Patek; John H. Price; David A. Rasmussen; Louis J. Schaefer; Thomas R. Scheidt; Mark A. Schulze; Philip D. Schumaker; Bichuan Shen; Randall G. Smith; Allen N. Su; Kenneth W. Tobin; William R. Usry; Edgar Voelkl; Karsten S. Weber; Paul G. Jones; Robert W. Owen

doi:10.1117/12.475659

Direct to digital holography for semiconductor wafer defect detection and review

C. E. Thomas, Tracy M. Bahm, Larry R. Baylor, Philip R. Bingham, Steven W. Burns, Matthew D. Chidley, Xiaolong Dai, Robert J. Delahanty, Christopher J. Doti, Ayman El-Khashab, Robert L. Fisher, Judd M. Gilbert, James S. Goddard, Gregory R. Hanson, Joel D. Hickson, Martin A. Hunt, Kathy W. Hylton, George C. John, Michael L. Jones, Kenneth R. MacDonaldMichael W. Mayo, Ian McMackin, David R. Patek, John H. Price, David A. Rasmussen, Louis J. Schaefer, Thomas R. Scheidt, Mark A. Schulze, Philip D. Schumaker, Bichuan Shen, Randall G. Smith, Allen N. Su, Kenneth W. Tobin, William R. Usry, Edgar Voelkl, Karsten S. Weber, Paul G. Jones, Robert W. Owen

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19 Scopus citations

Abstract

A method for recording true holograms (not holographic interferometry) directly to a digital video medium in a single image has been invented. This technology makes the amplitude and phase for every pixel of the target object wave available. Since phase is proportional to wavelength, this makes high-resolution metrology an implicit part of the holographic recording. Measurements of phase can be made to one hundredth or even one thousandth of a wavelength, so the technology is attractive for finding defects on semiconductor wafers, where feature sizes are now smaller than the wavelength of even deep ultra-violet light.

Original language	English
Pages (from-to)	180-194
Number of pages	15
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4692
DOIs	https://doi.org/10.1117/12.475659
State	Published - 2002

Keywords

Digital holography
High aspect ratio inspection (HARI)
Semiconductor metrology
Semiconductor wafer defects

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Thomas, C. E., Bahm, T. M., Baylor, L. R., Bingham, P. R., Burns, S. W., Chidley, M. D., Dai, X., Delahanty, R. J., Doti, C. J., El-Khashab, A., Fisher, R. L., Gilbert, J. M., Goddard, J. S., Hanson, G. R., Hickson, J. D., Hunt, M. A., Hylton, K. W., John, G. C., Jones, M. L., ... Owen, R. W. (2002). Direct to digital holography for semiconductor wafer defect detection and review. Proceedings of SPIE - The International Society for Optical Engineering, 4692, 180-194. https://doi.org/10.1117/12.475659

@article{2b4d62beafd94e26947b5161d11a132d,

title = "Direct to digital holography for semiconductor wafer defect detection and review",

abstract = "A method for recording true holograms (not holographic interferometry) directly to a digital video medium in a single image has been invented. This technology makes the amplitude and phase for every pixel of the target object wave available. Since phase is proportional to wavelength, this makes high-resolution metrology an implicit part of the holographic recording. Measurements of phase can be made to one hundredth or even one thousandth of a wavelength, so the technology is attractive for finding defects on semiconductor wafers, where feature sizes are now smaller than the wavelength of even deep ultra-violet light.",

keywords = "Digital holography, High aspect ratio inspection (HARI), Semiconductor metrology, Semiconductor wafer defects",

author = "Thomas, \{C. E.\} and Bahm, \{Tracy M.\} and Baylor, \{Larry R.\} and Bingham, \{Philip R.\} and Burns, \{Steven W.\} and Chidley, \{Matthew D.\} and Xiaolong Dai and Delahanty, \{Robert J.\} and Doti, \{Christopher J.\} and Ayman El-Khashab and Fisher, \{Robert L.\} and Gilbert, \{Judd M.\} and Goddard, \{James S.\} and Hanson, \{Gregory R.\} and Hickson, \{Joel D.\} and Hunt, \{Martin A.\} and Hylton, \{Kathy W.\} and John, \{George C.\} and Jones, \{Michael L.\} and MacDonald, \{Kenneth R.\} and Mayo, \{Michael W.\} and Ian McMackin and Patek, \{David R.\} and Price, \{John H.\} and Rasmussen, \{David A.\} and Schaefer, \{Louis J.\} and Scheidt, \{Thomas R.\} and Schulze, \{Mark A.\} and Schumaker, \{Philip D.\} and Bichuan Shen and Smith, \{Randall G.\} and Su, \{Allen N.\} and Tobin, \{Kenneth W.\} and Usry, \{William R.\} and Edgar Voelkl and Weber, \{Karsten S.\} and Jones, \{Paul G.\} and Owen, \{Robert W.\}",

year = "2002",

doi = "10.1117/12.475659",

language = "English",

volume = "4692",

pages = "180--194",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "Society of Photo-Optical Instrumentation Engineers",

}

Thomas, CE, Bahm, TM, Baylor, LR , Bingham, PR, Burns, SW, Chidley, MD, Dai, X, Delahanty, RJ, Doti, CJ, El-Khashab, A, Fisher, RL, Gilbert, JM, Goddard, JS, Hanson, GR, Hickson, JD, Hunt, MA, Hylton, KW, John, GC, Jones, ML, MacDonald, KR, Mayo, MW, McMackin, I, Patek, DR, Price, JH, Rasmussen, DA, Schaefer, LJ, Scheidt, TR, Schulze, MA, Schumaker, PD, Shen, B, Smith, RG, Su, AN, Tobin, KW, Usry, WR, Voelkl, E, Weber, KS, Jones, PG & Owen, RW 2002, 'Direct to digital holography for semiconductor wafer defect detection and review', Proceedings of SPIE - The International Society for Optical Engineering, vol. 4692, pp. 180-194. https://doi.org/10.1117/12.475659

TY - JOUR

T1 - Direct to digital holography for semiconductor wafer defect detection and review

AU - Thomas, C. E.

AU - Bahm, Tracy M.

AU - Baylor, Larry R.

AU - Bingham, Philip R.

AU - Burns, Steven W.

AU - Chidley, Matthew D.

AU - Dai, Xiaolong

AU - Delahanty, Robert J.

AU - Doti, Christopher J.

AU - El-Khashab, Ayman

AU - Fisher, Robert L.

AU - Gilbert, Judd M.

AU - Goddard, James S.

AU - Hanson, Gregory R.

AU - Hickson, Joel D.

AU - Hunt, Martin A.

AU - Hylton, Kathy W.

AU - John, George C.

AU - Jones, Michael L.

AU - MacDonald, Kenneth R.

AU - Mayo, Michael W.

AU - McMackin, Ian

AU - Patek, David R.

AU - Price, John H.

AU - Rasmussen, David A.

AU - Schaefer, Louis J.

AU - Scheidt, Thomas R.

AU - Schulze, Mark A.

AU - Schumaker, Philip D.

AU - Shen, Bichuan

AU - Smith, Randall G.

AU - Su, Allen N.

AU - Tobin, Kenneth W.

AU - Usry, William R.

AU - Voelkl, Edgar

AU - Weber, Karsten S.

AU - Jones, Paul G.

AU - Owen, Robert W.

PY - 2002

Y1 - 2002

N2 - A method for recording true holograms (not holographic interferometry) directly to a digital video medium in a single image has been invented. This technology makes the amplitude and phase for every pixel of the target object wave available. Since phase is proportional to wavelength, this makes high-resolution metrology an implicit part of the holographic recording. Measurements of phase can be made to one hundredth or even one thousandth of a wavelength, so the technology is attractive for finding defects on semiconductor wafers, where feature sizes are now smaller than the wavelength of even deep ultra-violet light.

AB - A method for recording true holograms (not holographic interferometry) directly to a digital video medium in a single image has been invented. This technology makes the amplitude and phase for every pixel of the target object wave available. Since phase is proportional to wavelength, this makes high-resolution metrology an implicit part of the holographic recording. Measurements of phase can be made to one hundredth or even one thousandth of a wavelength, so the technology is attractive for finding defects on semiconductor wafers, where feature sizes are now smaller than the wavelength of even deep ultra-violet light.

KW - Digital holography

KW - High aspect ratio inspection (HARI)

KW - Semiconductor metrology

KW - Semiconductor wafer defects

UR - https://www.scopus.com/pages/publications/0043101055

U2 - 10.1117/12.475659

DO - 10.1117/12.475659

M3 - Article

AN - SCOPUS:0043101055

SN - 0277-786X

VL - 4692

SP - 180

EP - 194

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

ER -

Direct to digital holography for semiconductor wafer defect detection and review

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Keywords

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