Direct to digital holography for semiconductor wafer defect detection and review

C. E. Thomas, Tracy M. Bahm, Larry R. Baylor, Philip R. Bingham, Steven W. Burns, Matthew D. Chidley, Xiaolong Dai, Robert J. Delahanty, Christopher J. Doti, Ayman El-Khashab, Robert L. Fisher, Judd M. Gilbert, James S. Goddard, Gregory R. Hanson, Joel D. Hickson, Martin A. Hunt, Kathy W. Hylton, George C. John, Michael L. Jones, Kenneth R. MacDonaldMichael W. Mayo, Ian McMackin, David R. Patek, John H. Price, David A. Rasmussen, Louis J. Schaefer, Thomas R. Scheidt, Mark A. Schulze, Philip D. Schumaker, Bichuan Shen, Randall G. Smith, Allen N. Su, Kenneth W. Tobin, William R. Usry, Edgar Voelkl, Karsten S. Weber, Paul G. Jones, Robert W. Owen

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

A method for recording true holograms (not holographic interferometry) directly to a digital video medium in a single image has been invented. This technology makes the amplitude and phase for every pixel of the target object wave available. Since phase is proportional to wavelength, this makes high-resolution metrology an implicit part of the holographic recording. Measurements of phase can be made to one hundredth or even one thousandth of a wavelength, so the technology is attractive for finding defects on semiconductor wafers, where feature sizes are now smaller than the wavelength of even deep ultra-violet light.

Original languageEnglish
Pages (from-to)180-194
Number of pages15
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4692
DOIs
StatePublished - 2002

Keywords

  • Digital holography
  • High aspect ratio inspection (HARI)
  • Semiconductor metrology
  • Semiconductor wafer defects

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