Direct observation of anti-phase boundaries in heteroepitaxy of GaSb thin films grown on Si(001) by transmission electron microscopy

S. Y. Woo, S. Hosseini Vajargah, S. Ghanad-Tavakoli, R. N. Kleiman, G. A. Botton

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12 Scopus citations

Abstract

Unambiguous identification of anti-phase boundaries (APBs) in heteroepitaxial films of GaSb grown on Si has been so far elusive. In this work, we present conventional transmission electron microscopy (TEM) diffraction contrast imaging using superlattice reflections, in conjunction with convergent beam electron diffraction analysis, to determine a change in polarity across APBs in order to confirm the presence of anti-phase disorder. In-depth analysis of anti-phase disorder is further supported with atomic resolution high-angle annular dark-field scanning transmission electron microscopy. The nature of APBs in GaSb is further elucidated by a comparison to previous results for GaAs epilayers grown on Si.

Original languageEnglish
Article number074306
JournalJournal of Applied Physics
Volume112
Issue number7
DOIs
StatePublished - Oct 1 2012
Externally publishedYes

Funding

S.Y.W. would like to thank Gabriel Devenyi for the helpful discussions. This work was supported by the Ontario Centres of Excellence and ARISE Technologies. Electron Microscopy work was carried out at the Canadian Centre for Electron Microscopy, a facility supported by NSERC and McMaster University.

FundersFunder number
Ontario Centres of Excellence
McMaster University
Natural Sciences and Engineering Research Council of Canada
Arisys Technologies

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