Abstract
An efficient process for direct pattern writing of thin metallic films has been developed using a 121.6 nm vacuum ultraviolet source by photodissociation of metalorganic materials. The optical reflection, crystal structure, and surface morphology of photodissociated palladium thin films were studied using a spectrophotometer, x-ray diffraction, and scanning electron microscopy. A pattern of 5 μm palladium lines separated by 5 μm spaces was produced on glass substrate by contact printing lithography.
| Original language | English |
|---|---|
| Pages (from-to) | 3202-3205 |
| Number of pages | 4 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 22 |
| Issue number | 6 |
| DOIs | |
| State | Published - Nov 2004 |
| Externally published | Yes |
Funding
The authors thank Dr. Jousef Mohajer for his help in the determination of chemical compounds. This work was supported by the U.S. Defense Advanced Research Projects Agency (DARPA) under Contract No. DAAD 19-99-1-0277 and administered by the Army Research Office. Thanks to Cornell University National Nanofabrication Facility for fabrication of the masks.
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