Direct metal pattern writing by VUV photodissociation

Jianxun Yan; Mool C. Gupta

doi:10.1116/1.1802871

Direct metal pattern writing by VUV photodissociation

Jianxun Yan, Mool C. Gupta

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

An efficient process for direct pattern writing of thin metallic films has been developed using a 121.6 nm vacuum ultraviolet source by photodissociation of metalorganic materials. The optical reflection, crystal structure, and surface morphology of photodissociated palladium thin films were studied using a spectrophotometer, x-ray diffraction, and scanning electron microscopy. A pattern of 5 μm palladium lines separated by 5 μm spaces was produced on glass substrate by contact printing lithography.

Original language	English
Pages (from-to)	3202-3205
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	6
DOIs	https://doi.org/10.1116/1.1802871
State	Published - Nov 2004
Externally published	Yes

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abstract = "An efficient process for direct pattern writing of thin metallic films has been developed using a 121.6 nm vacuum ultraviolet source by photodissociation of metalorganic materials. The optical reflection, crystal structure, and surface morphology of photodissociated palladium thin films were studied using a spectrophotometer, x-ray diffraction, and scanning electron microscopy. A pattern of 5 μm palladium lines separated by 5 μm spaces was produced on glass substrate by contact printing lithography.",

author = "Jianxun Yan and Gupta, {Mool C.}",

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AU - Gupta, Mool C.

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AB - An efficient process for direct pattern writing of thin metallic films has been developed using a 121.6 nm vacuum ultraviolet source by photodissociation of metalorganic materials. The optical reflection, crystal structure, and surface morphology of photodissociated palladium thin films were studied using a spectrophotometer, x-ray diffraction, and scanning electron microscopy. A pattern of 5 μm palladium lines separated by 5 μm spaces was produced on glass substrate by contact printing lithography.

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ER -

Direct metal pattern writing by VUV photodissociation

Abstract

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