Abstract
Self-assembled monolayers (SAMs) of alkyl thiols are frequently used to chemically functionalize gold surfaces for applications throughout materials chemistry, electrochemistry, and biotechnology. Despite this, a detailed understanding of the structure of the SAM−water interface generated from both formation and use of the SAM in an aqueous environment is elusive, and analytical measurements of the structure and chemistry of the SAM−water interface are an ongoing experimental challenge. To address this, we used neutron reflectometry (NR) to measure water association with both hydrophobic and hydrophilic SAMs under both wet and dry conditions. SAMs used for this study were made from hydrophobic decanethiol mixed with hydrophilic 11-azido-1-undecanethiol with compositions of 0−100% of the azide-terminated thiol. All SAMs were formed by conventional solution incubation of a Au substrate immersed in ethanol. Each SAM was characterized by grazing incidence angle reflection− absorption Fourier transfer infrared spectroscopy, contact angle goniometry, and electrochemical methods to confirm it was a completely formed monolayer with evidence of extensive crystalline-like domains. NR measured significant absorption of water into each SAM, ranging from 1.6 to 5.7 water molecules per alkyl thiol, when SAMs were immersed in water. Water infiltration was independent of SAM composition and terminal group hydrophilicity. These results demonstrate that water accesses defects, fluid regions, and heterogeneous domains inherent to even well-formed SAMs.
Original language | English |
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Pages (from-to) | 5647-5662 |
Number of pages | 16 |
Journal | Langmuir |
Volume | 35 |
Issue number | 16 |
DOIs | |
State | Published - Apr 23 2019 |
Funding
This research was supported through grants awarded by the National Science Foundation (CHE-1361252 and CHE-1807215 to L.J.W. and DGE-1110007 to J.E.D.) and Army Research Office (W911NF-17-1-0089 to L.J.W.). The research at Oak Ridge National Laboratory\u2019s Spallation Neutron Source was sponsored by the Scientific User Facilities Division, Office of Basic Energy Sciences, U.S. Department of Energy. The authors acknowledge the NIST/CNST NanoFab facility for providing Si wafers coated with smooth Au. The authors are also grateful for the instrumental resources provided by the Texas Materials Institute at the University of Texas at Austin in addition to the electrochemical setup loaned by the University of Texas at Austin\u2019s teaching laboratory stockroom.