Development of high power EUV sources for lithography

Vladimir M. Borisov, Imtiaz Ahmad, Sven Goetze, Alexander S. Ivanov, Oleg B. Khristoforov, Jurgen Kleinschmidt, Vladimir Korobotchko, Jens Ringling, Guido Schriever, Uwe Stamm, Alexander Y. Vinokhodov

Research output: Contribution to journalArticlepeer-review

22 Scopus citations

Abstract

We report on the experimental status of the development of gas discharge produced plasma EUV sources for lithography based on the Z-pinch concept. The plasma size of ∼1.3 mm × 1.5 mm has been matched to come close to the requirements resulting from the etendue of the optical system. The spatial stability of the plasma size as well as the plasma center is better than 15 % standard deviation. The solid angle of emission is 1.8 sr, i.e. +/- 45 deg. The sources can be operated continuously at 1000 Hz repetition frequency and provide an EUV in-band power of 10 W in 1.8 sr. Spectral measurements providing in-band and out-of-band spectral distribution of the source are discussed.

Original languageEnglish
Pages (from-to)626-633
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4688
Issue number2
DOIs
StatePublished - 2002
Externally publishedYes

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