Abstract
In this paper, an analytical model for a vertical double implanted metal-oxide semiconductor (DIMOS) transistor structure in 4H-Silicon Carbide (SiC) is presented. Simulation for transport characteristics of the SiC MOSFET with the exact device geometry is carried out using the commercial device simulator MEDICI. A rigorous experimental testing and characterization is done on a 4H-SiC DIMOS transistor test device. SPICE parameters are extracted from the measurements, and a SPICE model for the DIMOS transistor has been developed. The presented work is a part of team efforts of material, device, and power electronics researchers at the University of Tennessee and Oak Ridge National Laboratory.
Original language | English |
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Pages (from-to) | 733-746 |
Number of pages | 14 |
Journal | International Journal of High Speed Electronics and Systems |
Volume | 16 |
Issue number | 2 |
DOIs | |
State | Published - Jun 2006 |
Funding
This project is supported by ORNL and the U.S. Department of Energy's Office of Advanced Transportation Technology Freedom Car Research Program.
Funders | Funder number |
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U.S. Department of Energy | |
Oak Ridge National Laboratory |