Derivative photoelectron holography of As/Si(001)

Paul J.E. Reese, T. Miller, T. C. Chiang

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

The new technique of derivative photoelectron holography is used to examine the As-terminated Si(001) surface, which exhibits a two-domain (2 × 1) reconstruction. Logarithmic derivatives of the photoemission intensity are measured, from which the intensity fine structure function is deduced. Since the logarithmic derivative function is independent of the incident beam intensity and the detection efficiency, most experimental uncertainties are eliminated. The resulting atomic images are in good agreement with expectation.

Original languageEnglish
Pages (from-to)400-406
Number of pages7
JournalSurface Science
Volume445
Issue number2-3
DOIs
StatePublished - Jan 20 2000
Externally publishedYes

Funding

This work was supported by the US Department of Energy (Division of Materials Sciences, Office of Basic Energy Sciences) under Grant No. DEFG02-91ER45439. The Synchrotron Radiation Center of the University of Wisconsin-Madison is supported by the US National Science Foundation Grant No. DMR-95-31009. An acknowledgement is also made to the Donors of the Petroleum Research Fund, administered by the American Chemical Society, and to the US National Science Foundation Grant Nos. DMR-99-75182 and 99-75470 for partial personnel and equipment support in connection with the synchrotron beamline operation.

FundersFunder number
National Science Foundation99-75470, DMR-99-75182, DMR-95-31009
U.S. Department of Energy
American Chemical Society
Basic Energy SciencesDEFG02-91ER45439

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