DAMAGE PRODUCTION IN beta -SiC DURING ION IMPLANTATION.

S. P. Withrow, K. More, John A. Edmond, H. S. Kong, P. J. Maziasz, R. F. Davis

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

Damage in single crystal beta -SiC(100) as a result of ion bombardment has been studied using Rutherford backscattering (RBS) and cross-section transmission electron microscopy (X-TEM). Samples were implanted with 123 keV **2**7Al at liquid nitrogen temperature. RBS spectra for He channeling in the (110) axis at 45 degree were obtained as a function of implantation dose to determine damage accumulation. X-TEM was used to characterize damage structure for selected doses. The surface of the SiC becomes amorphous for doses greater than 1 multiplied by 10**1**5 /cm**2. At lower doses, significant uniaxial lattice strain along the (100) direction is suggested by comparison of RBS channeling spectra obtained for several high index axes. High resolution TEM on a sample implanted at 4 multiplied by 10**1**4 /cm**2 shows no damage structure in the surface region; lattice damage in a broad layer centered roughly at the depth of highest energy deposition is characterized by small amorphous pockets in a crystalline matrix.

Original languageEnglish
Title of host publicationMaterials Research Society Symposia Proceedings
EditorsMichael O. Thompson, S.Thomas Picraux, James S. Williams
PublisherMaterials Research Soc
Pages373-378
Number of pages6
ISBN (Print)0931837405
StatePublished - 1987
EventBeam-Solid Interact and Transient Processes - Boston, MA, USA
Duration: Dec 1 1986Dec 4 1986

Publication series

NameMaterials Research Society Symposia Proceedings
Volume74
ISSN (Print)0272-9172

Conference

ConferenceBeam-Solid Interact and Transient Processes
CityBoston, MA, USA
Period12/1/8612/4/86

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