Abstract
We investigate the kinetic pathways to coherent island formation during the stress-driven roughening of strained films, and specifically examine the role of facets during island nucleation. Despite the ubiquitous appearance of (501)\ facets in the Si-Ge system, we show that for (Formula presented) strained layers, the initial islanding pathway does not involve discrete (501)\ facets. A kinetic model based on interacting surface steps is developed, which explains the observed pathway and is consistent with the sensitive dependence of the 2D-3D transition on temperature and the sign of misfit.
| Original language | English |
|---|---|
| Pages (from-to) | R1700-R1703 |
| Journal | Physical Review B - Condensed Matter and Materials Physics |
| Volume | 56 |
| Issue number | 4 |
| DOIs | |
| State | Published - 1997 |