CrAlN film deposited by magnetron sputtering for the inkjet printer head

Seon Cheol Moon; Sang Ho Kim

doi:10.1166/jnn.2014.10059

CrAlN film deposited by magnetron sputtering for the inkjet printer head

Seon Cheol Moon, Sang Ho Kim

Research output: Contribution to journal › Article › peer-review

Abstract

CrAlN film has advantages of stability and multifunctionality over the commercial TaN_0.8• This study investigated the characteristics of CrAlN film deposited by radio frequency magnetron sputtering as a function of Al content after deposition heat treatment. With a 600 °C heat treatment and 20% Al content, the low temperature coefficient of resistance (-2670.6 ppm/k), high oxidation resistance, and thermal conductivity were acquired. This was found due to the high-density columnar NaCl structure with 20% Al and the recrystallization utilized by heat treatment.

Original language	English
Pages (from-to)	8946-8951
Number of pages	6
Journal	Journal of Nanoscience and Nanotechnology
Volume	14
Issue number	12
DOIs	https://doi.org/10.1166/jnn.2014.10059
State	Published - Dec 1 2014
Externally published	Yes

Keywords

CrAlN
Heat Resistor
Inkjet Printer
Magnetron Sputtering
Temperature Coefficient of Resistance (TCR)

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10.1166/jnn.2014.10059

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title = "CrAlN film deposited by magnetron sputtering for the inkjet printer head",

abstract = "CrAlN film has advantages of stability and multifunctionality over the commercial TaN0.8• This study investigated the characteristics of CrAlN film deposited by radio frequency magnetron sputtering as a function of Al content after deposition heat treatment. With a 600 °C heat treatment and 20\% Al content, the low temperature coefficient of resistance (-2670.6 ppm/k), high oxidation resistance, and thermal conductivity were acquired. This was found due to the high-density columnar NaCl structure with 20\% Al and the recrystallization utilized by heat treatment.",

keywords = "CrAlN, Heat Resistor, Inkjet Printer, Magnetron Sputtering, Temperature Coefficient of Resistance (TCR)",

author = "Moon, \{Seon Cheol\} and Kim, \{Sang Ho\}",

note = "Publisher Copyright: {\textcopyright} 2014 American Scientific Publishers.",

year = "2014",

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doi = "10.1166/jnn.2014.10059",

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AU - Moon, Seon Cheol

AU - Kim, Sang Ho

PY - 2014/12/1

Y1 - 2014/12/1

N2 - CrAlN film has advantages of stability and multifunctionality over the commercial TaN0.8• This study investigated the characteristics of CrAlN film deposited by radio frequency magnetron sputtering as a function of Al content after deposition heat treatment. With a 600 °C heat treatment and 20% Al content, the low temperature coefficient of resistance (-2670.6 ppm/k), high oxidation resistance, and thermal conductivity were acquired. This was found due to the high-density columnar NaCl structure with 20% Al and the recrystallization utilized by heat treatment.

AB - CrAlN film has advantages of stability and multifunctionality over the commercial TaN0.8• This study investigated the characteristics of CrAlN film deposited by radio frequency magnetron sputtering as a function of Al content after deposition heat treatment. With a 600 °C heat treatment and 20% Al content, the low temperature coefficient of resistance (-2670.6 ppm/k), high oxidation resistance, and thermal conductivity were acquired. This was found due to the high-density columnar NaCl structure with 20% Al and the recrystallization utilized by heat treatment.

KW - CrAlN

KW - Heat Resistor

KW - Inkjet Printer

KW - Magnetron Sputtering

KW - Temperature Coefficient of Resistance (TCR)

UR - https://www.scopus.com/pages/publications/84911407224

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DO - 10.1166/jnn.2014.10059

M3 - Article

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SN - 1533-4880

VL - 14

SP - 8946

EP - 8951

JO - Journal of Nanoscience and Nanotechnology

JF - Journal of Nanoscience and Nanotechnology

IS - 12

ER -

CrAlN film deposited by magnetron sputtering for the inkjet printer head

Abstract

Keywords

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