CrAlN film deposited by magnetron sputtering for the inkjet printer head

Seon Cheol Moon; Sang Ho Kim

doi:10.1166/jnn.2014.10059

CrAlN film deposited by magnetron sputtering for the inkjet printer head

Seon Cheol Moon, Sang Ho Kim

Research output: Contribution to journal › Article › peer-review

Abstract

CrAlN film has advantages of stability and multifunctionality over the commercial TaN_0.8• This study investigated the characteristics of CrAlN film deposited by radio frequency magnetron sputtering as a function of Al content after deposition heat treatment. With a 600 °C heat treatment and 20% Al content, the low temperature coefficient of resistance (-2670.6 ppm/k), high oxidation resistance, and thermal conductivity were acquired. This was found due to the high-density columnar NaCl structure with 20% Al and the recrystallization utilized by heat treatment.

Original language	English
Pages (from-to)	8946-8951
Number of pages	6
Journal	Journal of Nanoscience and Nanotechnology
Volume	14
Issue number	12
DOIs	https://doi.org/10.1166/jnn.2014.10059
State	Published - Dec 1 2014
Externally published	Yes

Keywords

CrAlN
Heat Resistor
Inkjet Printer
Magnetron Sputtering
Temperature Coefficient of Resistance (TCR)

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10.1166/jnn.2014.10059

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@article{eb1ac9a27a2347b9a1fcb3f09d751287,

title = "CrAlN film deposited by magnetron sputtering for the inkjet printer head",

abstract = "CrAlN film has advantages of stability and multifunctionality over the commercial TaN0.8• This study investigated the characteristics of CrAlN film deposited by radio frequency magnetron sputtering as a function of Al content after deposition heat treatment. With a 600 °C heat treatment and 20% Al content, the low temperature coefficient of resistance (-2670.6 ppm/k), high oxidation resistance, and thermal conductivity were acquired. This was found due to the high-density columnar NaCl structure with 20% Al and the recrystallization utilized by heat treatment.",

keywords = "CrAlN, Heat Resistor, Inkjet Printer, Magnetron Sputtering, Temperature Coefficient of Resistance (TCR)",

author = "Moon, {Seon Cheol} and Kim, {Sang Ho}",

note = "Publisher Copyright: {\textcopyright} 2014 American Scientific Publishers.",

year = "2014",

month = dec,

day = "1",

doi = "10.1166/jnn.2014.10059",

language = "English",

volume = "14",

pages = "8946--8951",

journal = "Journal of Nanoscience and Nanotechnology",

issn = "1533-4880",

publisher = "American Scientific Publishers",

number = "12",

}

TY - JOUR

T1 - CrAlN film deposited by magnetron sputtering for the inkjet printer head

AU - Moon, Seon Cheol

AU - Kim, Sang Ho

PY - 2014/12/1

Y1 - 2014/12/1

N2 - CrAlN film has advantages of stability and multifunctionality over the commercial TaN0.8• This study investigated the characteristics of CrAlN film deposited by radio frequency magnetron sputtering as a function of Al content after deposition heat treatment. With a 600 °C heat treatment and 20% Al content, the low temperature coefficient of resistance (-2670.6 ppm/k), high oxidation resistance, and thermal conductivity were acquired. This was found due to the high-density columnar NaCl structure with 20% Al and the recrystallization utilized by heat treatment.

AB - CrAlN film has advantages of stability and multifunctionality over the commercial TaN0.8• This study investigated the characteristics of CrAlN film deposited by radio frequency magnetron sputtering as a function of Al content after deposition heat treatment. With a 600 °C heat treatment and 20% Al content, the low temperature coefficient of resistance (-2670.6 ppm/k), high oxidation resistance, and thermal conductivity were acquired. This was found due to the high-density columnar NaCl structure with 20% Al and the recrystallization utilized by heat treatment.

KW - CrAlN

KW - Heat Resistor

KW - Inkjet Printer

KW - Magnetron Sputtering

KW - Temperature Coefficient of Resistance (TCR)

UR - http://www.scopus.com/inward/record.url?scp=84911407224&partnerID=8YFLogxK

U2 - 10.1166/jnn.2014.10059

DO - 10.1166/jnn.2014.10059

M3 - Article

AN - SCOPUS:84911407224

SN - 1533-4880

VL - 14

SP - 8946

EP - 8951

JO - Journal of Nanoscience and Nanotechnology

JF - Journal of Nanoscience and Nanotechnology

IS - 12

ER -

CrAlN film deposited by magnetron sputtering for the inkjet printer head

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Keywords

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