Correlation of indentation-induced phase transformations with the degree of relaxation of ion-implanted amorphous silicon

Leonardus B. Bayu Aji, S. Ruffell, B. Haberl, J. E. Bradby, J. S. Williams

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

The probability for amorphous silicon (a-Si) to phase transform under indentation testing is statistically determined as a function of annealing temperature from the probability of a pop-out event occurring on the unloading curve. Raman microspectroscopy is used to confirm that the presence of a pop-out event during indentation is a clear signature that a-Si undergoes phase transformation. The probability for such a phase transformation increases with annealing temperature and reaches 100% at a temperature of 340 °C, a temperature well before the temperature where the average bond-angle distortion is fully minimized. This suggests that multiple processes are occurring during full relaxation.

Original languageEnglish
Pages (from-to)1056-1060
Number of pages5
JournalJournal of Materials Research
Volume28
Issue number8
DOIs
StatePublished - Apr 28 2013
Externally publishedYes

Fingerprint

Dive into the research topics of 'Correlation of indentation-induced phase transformations with the degree of relaxation of ion-implanted amorphous silicon'. Together they form a unique fingerprint.

Cite this