Corrections to "growth of lanthanum manganate buffer layers for coated conductors via a metal-organic decomposition process"

Kartik Venkataraman; Eric E. Hellstrom; Mariappan Paranthaman

doi:10.1109/TASC.2008.2007235

Corrections to "growth of lanthanum manganate buffer layers for coated conductors via a metal-organic decomposition process"

Kartik Venkataraman, Eric E. Hellstrom, Mariappan Paranthaman

Nanomaterials Chemistry Group

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

In our prior paper, we reported forming (110)-oriented LaMnO₃ on a biaxially textured Ni-3at%W substrate. Chemical analysis of these films subsequent to publishing the paper showed only La and O-there was no Mn present in the film. The film was actually (400)-oriented La₂ O₃ with the cubic bixbyite structure. Subsequent studies also showed that MnO film is not stable on Ni and Ni-W substrate surfaces at 1100 °C and P _O2 = 10^-16 atm where bulk MnO is stable.

Original language	English
Pages (from-to)	1801-1803
Number of pages	3
Journal	IEEE Transactions on Applied Superconductivity
Volume	18
Issue number	4
DOIs	https://doi.org/10.1109/TASC.2008.2007235
State	Published - Dec 2008

Funding

Manuscript received June 08, 2008. Current version published December 04, 2008. This work was supported by the U.S. Department of Energy, Office of Electricity Delivery and Energy Reliability (OE). This paper was recommended by Associate Editor J. O. Willis.

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10.1109/TASC.2008.2007235

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abstract = "In our prior paper, we reported forming (110)-oriented LaMnO3 on a biaxially textured Ni-3at%W substrate. Chemical analysis of these films subsequent to publishing the paper showed only La and O-there was no Mn present in the film. The film was actually (400)-oriented La2 O3 with the cubic bixbyite structure. Subsequent studies also showed that MnO film is not stable on Ni and Ni-W substrate surfaces at 1100 °C and P O2 = 10-16 atm where bulk MnO is stable.",

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Corrections to "growth of lanthanum manganate buffer layers for coated conductors via a metal-organic decomposition process"

Abstract

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