Controlled positioning of nanoparticles on graphene by noninvasive AFM lithography

Elena Bellido; Isaac Ojea-Jiménez; Alberto Ghirri; Christian Alvino; Andrea Candini; Victor Puntes; Marco Affronte; Neus Domingo; Daniel Ruiz-Molina

doi:10.1021/la3023419

Controlled positioning of nanoparticles on graphene by noninvasive AFM lithography

Elena Bellido, Isaac Ojea-Jiménez, Alberto Ghirri, Christian Alvino, Andrea Candini, Victor Puntes, Marco Affronte, Neus Domingo, Daniel Ruiz-Molina

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

Atomic force microscopy is shown to be an excellent lithographic technique to directly deposit nanoparticles on graphene by capillary transport without any previous functionalization of neither the nanoparticles nor the graphene surface while preserving its integrity and conductivity properties. Moreover this technique allows for (sub)micrometric control on the positioning thanks to a new three-step protocol that has been designed with this aim. With this methodology the exact target coordinates are registered by scanning the tip over the predetermined area previous to its coating with the ink and deposition. As a proof-of-concept, this strategy has successfully allowed the controlled deposition of few nanoparticles on 1 μm ² preselected sites of a graphene surface with high accuracy.

Original language	English
Pages (from-to)	12400-12409
Number of pages	10
Journal	Langmuir
Volume	28
Issue number	33
DOIs	https://doi.org/10.1021/la3023419
State	Published - Aug 21 2012
Externally published	Yes

Funding

Funders	Funder number
Seventh Framework Programme	211284

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10.1021/la3023419

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title = "Controlled positioning of nanoparticles on graphene by noninvasive AFM lithography",

abstract = "Atomic force microscopy is shown to be an excellent lithographic technique to directly deposit nanoparticles on graphene by capillary transport without any previous functionalization of neither the nanoparticles nor the graphene surface while preserving its integrity and conductivity properties. Moreover this technique allows for (sub)micrometric control on the positioning thanks to a new three-step protocol that has been designed with this aim. With this methodology the exact target coordinates are registered by scanning the tip over the predetermined area previous to its coating with the ink and deposition. As a proof-of-concept, this strategy has successfully allowed the controlled deposition of few nanoparticles on 1 μm 2 preselected sites of a graphene surface with high accuracy.",

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T1 - Controlled positioning of nanoparticles on graphene by noninvasive AFM lithography

AU - Bellido, Elena

AU - Ojea-Jiménez, Isaac

AU - Ghirri, Alberto

AU - Alvino, Christian

AU - Candini, Andrea

AU - Puntes, Victor

AU - Affronte, Marco

AU - Domingo, Neus

AU - Ruiz-Molina, Daniel

PY - 2012/8/21

Y1 - 2012/8/21

N2 - Atomic force microscopy is shown to be an excellent lithographic technique to directly deposit nanoparticles on graphene by capillary transport without any previous functionalization of neither the nanoparticles nor the graphene surface while preserving its integrity and conductivity properties. Moreover this technique allows for (sub)micrometric control on the positioning thanks to a new three-step protocol that has been designed with this aim. With this methodology the exact target coordinates are registered by scanning the tip over the predetermined area previous to its coating with the ink and deposition. As a proof-of-concept, this strategy has successfully allowed the controlled deposition of few nanoparticles on 1 μm 2 preselected sites of a graphene surface with high accuracy.

AB - Atomic force microscopy is shown to be an excellent lithographic technique to directly deposit nanoparticles on graphene by capillary transport without any previous functionalization of neither the nanoparticles nor the graphene surface while preserving its integrity and conductivity properties. Moreover this technique allows for (sub)micrometric control on the positioning thanks to a new three-step protocol that has been designed with this aim. With this methodology the exact target coordinates are registered by scanning the tip over the predetermined area previous to its coating with the ink and deposition. As a proof-of-concept, this strategy has successfully allowed the controlled deposition of few nanoparticles on 1 μm 2 preselected sites of a graphene surface with high accuracy.

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VL - 28

SP - 12400

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JO - Langmuir

JF - Langmuir

IS - 33

ER -

Controlled positioning of nanoparticles on graphene by noninvasive AFM lithography

Abstract

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