Abstract
The development of chemistry is reported to implement selective dual-wavelength olefin metathesis polymerization for continuous additive manufacturing (AM). A resin formulation based on dicyclopentadiene is produced using a latent olefin metathesis catalyst, various photosensitizers (PSs) and photobase generators (PBGs) to achieve efficient initiation at one wavelength (e.g., blue light) and fast catalyst decomposition and polymerization deactivation at a second (e.g., UV-light). This process enables 2D stereolithographic (SLA) printing, either using photomasks or patterned, collimated light. Importantly, the same process is readily adapted for 3D continuous AM, with printing rates of 36 mm h–1 for patterned light and up to 180 mm h–1 using un-patterned, high intensity light.
| Original language | English |
|---|---|
| Article number | 2200770 |
| Journal | Advanced Science |
| Volume | 9 |
| Issue number | 14 |
| DOIs | |
| State | Published - May 16 2022 |
| Externally published | Yes |
Funding
The authors thank David R. Wheeler for his review of the manuscript. This research was supported by the Laboratory Directed Research and Development program at Sandia National Laboratories. Any subjective views or opinions that might be expressed in the paper do not necessarily represent the views of the U.S. Department of Energy (DOE) or the U.S. Government. Sandia National Laboratories is a multi‐mission laboratory managed and operated by National Technology and Engineering Solutions of Sandia, LLC, a wholly owned subsidiary of Honeywell International, Inc., for the U.S. Department of Energy's National Nuclear Security Administration under contract DE‐NA‐0003525.
Keywords
- additive manufacturing
- dual-wavelength
- olefin metathesis
- photosensitizer
- stereolithography
