Abstract
The construction and performance of an ultrahigh vacuum-compatible high temperature vapor dosing system for low vapor pressure compounds were discussed. The dosing system was found to be maintained at elevated temperature to achieve sufficiently high gas pressure for rapid transfer to the surface. The analysis showed that the leak valve and the internal doser head were heated to a higher temperature than the source system to prevent condensation of the compound.
Original language | English |
---|---|
Pages (from-to) | 491-494 |
Number of pages | 4 |
Journal | Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films |
Volume | 21 |
Issue number | 2 |
DOIs | |
State | Published - 2003 |
Externally published | Yes |