Conduction behavior of SrBi₂Ta₂O₉ thin film grown by pulsed laser deposition

Engineering

• Thin Films 100%
• Pulsed Laser 100%
• Temperature Range 66%
• Ray Diffraction 33%
• Dielectrics 33%
• Measured Value 33%
• Hysteresis Loop 33%
• Si Substrate 33%
• Applied Electric Field 33%
• Applied Voltage 33%
• Coercive Field 33%
• Activation Energy 33%
• Surface Morphology 33%
• Silicon Dioxide 33%
• Electric Field 33%
• Electrical Measurement 33%

Material Science

• Pulsed Laser Deposition 100%
• Thin Films 100%
• Ferroelectricity 66%
• X-Ray Diffraction 33%
• Film 33%
• Surface Morphology 33%
• Capacitor 33%
• Activation Energy 33%
• Scanning Electron Microscopy 33%
• Permittivity 33%