@inproceedings{9bf409ed6ae94ebfa5a0fe7e2567ed34,
title = "COLUMN IIIA METAL FILM DEPOSITION BY LASER PHOTOIONIZATION OF METAL-HALIDE MOLECULES IN THE VAPOR PHASE.",
abstract = "Virtually all of the techniques that are currently used to grow semiconductor or metal films from the vapor phase deal with chemical reactants and products that are electrically neutral. The thin film deposition technique described here exploits the large photoionization cross-sections of several metal-halide molecules in the ultraviolet to produce large and easily controlled densities of positive metal ions. Such an approach offers several advantages over current techniques.",
author = "Geohegan, {D. B.} and McCown, {A. W.} and Eden, {J. G.}",
year = "1984",
language = "English",
isbn = "0444008942",
series = "Materials Research Society Symposia Proceedings",
publisher = "North-Holland",
pages = "93--100",
editor = "A.Wayne Johnson and Ehrlich, {Daniel J.} and Schlossberg, {Howard R.}",
booktitle = "Materials Research Society Symposia Proceedings",
}