TY - JOUR
T1 - Chemical vapor deposition of B13C2 from BCl3-CH4-H2-argon mixtures
AU - Moss, Thomas S.
AU - Lackey, W. Jack
AU - More, Karren L.
PY - 1998/12
Y1 - 1998/12
N2 - The deposition of boron carbide (B13C2) onto graphite substrates was accomplished by using a hot-wall chemical vapor deposition (CVD) reactor at a pressure of 10.1 kPa in the temperature range of 1000°-1400°C. A modified impinging-jet geometry was used to simplify the mass-transfer analysis. Coatings were characterized using X-ray diffractometry (XRD), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). The surface morphology was composed of well-defined facets, the size of which was dependent on the growth rate and deposition time, as would be expected from a competitive growth mechanism. TEM micrographs of the coating showed long, columnar grains that emanated from a narrow nucleation zone. The growth rate could be adequately described by a first-order kinetic expression, with respect to the bulk gas phase boron chloride (BCl3) concentration. The activation energy of the kinetic expression was estimated to be 93.1 kJ/mol. It was proposed that the deposition was limited by the adsorption of (BCl3) onto the substrate surface.
AB - The deposition of boron carbide (B13C2) onto graphite substrates was accomplished by using a hot-wall chemical vapor deposition (CVD) reactor at a pressure of 10.1 kPa in the temperature range of 1000°-1400°C. A modified impinging-jet geometry was used to simplify the mass-transfer analysis. Coatings were characterized using X-ray diffractometry (XRD), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). The surface morphology was composed of well-defined facets, the size of which was dependent on the growth rate and deposition time, as would be expected from a competitive growth mechanism. TEM micrographs of the coating showed long, columnar grains that emanated from a narrow nucleation zone. The growth rate could be adequately described by a first-order kinetic expression, with respect to the bulk gas phase boron chloride (BCl3) concentration. The activation energy of the kinetic expression was estimated to be 93.1 kJ/mol. It was proposed that the deposition was limited by the adsorption of (BCl3) onto the substrate surface.
UR - https://www.scopus.com/pages/publications/0032288658
U2 - 10.1111/j.1151-2916.1998.tb02741.x
DO - 10.1111/j.1151-2916.1998.tb02741.x
M3 - Article
AN - SCOPUS:0032288658
SN - 0002-7820
VL - 81
SP - 3077
EP - 3086
JO - Journal of the American Ceramic Society
JF - Journal of the American Ceramic Society
IS - 12
ER -