@inproceedings{2379e454b3014c4fbc19e82b6e7d3920,
title = "Chemical state mapping on material surfaces with the X1A second-generation scanning photoemission microscope (X1A SPEM-II)",
abstract = "The second generation scanning photoelectron microscope at beamline X1A of the National Synchrotron Light Source (X1A SPEM-II) is designed for spatially resolved elemental and chemical analysis by x ray photoelectron spectroscopy (XPS) on material surfaces. This microscope can focus photon energies between 300 to 800 eV with submicron spatial resolution. Multiple photoelectron images can be acquired simultaneously with the use of a hemispherical sector analyzer (HSA) with multi-channel detection (MCD), which enables a technique called 'parallel imaging for chemical state mapping' (PICSM). The PICSM technique was demonstrated using a Si/SiO 2 pattern.",
author = "Ko, \{Cheng Hao\} and Janos Kirz and Klaus Maier and Barry Winn and Harald Ade and Hulbert, \{Steven L.\} and Johnson, \{Erik D.\} and Anderson, \{Erik H.\}",
year = "1995",
language = "English",
isbn = "0819418757",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
pages = "150--159",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",
note = "X-Ray Microbeam Technology and Applications ; Conference date: 11-07-1995 Through 12-07-1995",
}