Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications

Reactions in solid-state chemistry are controlled by both underlying chemical reaction rates and temperature-dependent diffusion of reactants and products. Due to distinctly different activation energies, the relative rates of reaction and diffusion may shift dramatically with temperature. In this work, the acid catalyzed deprotection of acid labile groups of model chemically amplified photopolymers was studied to understand the effects of temperature on diffusion-coupled reactions. In these systems, strong acids form during exposure of photoacid generators (PAGs) to ultraviolet radiation and then diffuse and catalyze deprotection reactions. By using very short duration laser-induced heating for the postexposure bake step, the potential reaction temperature range is extended by several hundred degrees compared to traditional thermal processing temperatures. Thermal degradation at these temperatures is avoided by simultaneously reducing the heating time from minutes to submilliseconds. Both diffusion and reaction rates were measured in this high temperature region for three different photoresists combined with two different PAGs, with activation energies of the key processes determined. The interplay of diffusion and reaction rates was also examined by comparing results of high-resolution pattern formation. The best image formation at high temperature was achieved using photoresists with high deprotection rates combined with PAGs exhibiting low diffusivity.