Chemical grafting of silane end-functionalized polymer on silicon surfaces

A. Karim, S. K. Satija, W. Orts, J. F. Ankner, C. F. Majkrzak, L. J. Fetters

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

11 Scopus citations

Abstract

X-ray and neutron reflectivity was used to determine the kinetics of adsorption and characterize the concentration profile of a low molecular weight trichlorosilane end-functionalized polystyrene adsorbed onto polished silicon wafers. Higher adsorbed amounts were obtained from a cyclohexane solution of the polymer rather than toluene, with kinetics that followed a stretched exponential behavior. For moderately high grafting densities the polymer concentration profile in deuterated toluene (a good solvent) was best modelled using a small tailed parabola. In deuterated cyclohexane (a poor solvent) the brush profile steepened but was substantially smoother than a step, while in D2O (a non-solvent) it became step-like.

Original languageEnglish
Title of host publicationPolymer/Inorganic Interfaces
PublisherPubl by Materials Research Society
Pages149-154
Number of pages6
ISBN (Print)1558992006, 9781558992009
DOIs
StatePublished - 1993
Externally publishedYes
EventMaterials Research Society Spring Meeting - San Francisco, CA, USA
Duration: Apr 12 1993Apr 15 1993

Publication series

NameMaterials Research Society Symposium Proceedings
Volume304
ISSN (Print)0272-9172

Conference

ConferenceMaterials Research Society Spring Meeting
CitySan Francisco, CA, USA
Period04/12/9304/15/93

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