Chemical detection based on adsorption-induced and photoinduced stresses in microelectromechanical systems devices

P. G. Datskos; S. Rajic; M. J. Sepaniak; N. Lavrik; C. A. Tipple; L. R. Senesac; I. Datskou

doi:10.1116/1.1387082

Chemical detection based on adsorption-induced and photoinduced stresses in microelectromechanical systems devices

P. G. Datskos, S. Rajic, M. J. Sepaniak, N. Lavrik, C. A. Tipple, L. R. Senesac, I. Datskou

Research output: Contribution to journal › Conference article › peer-review

61 Scopus citations

Abstract

An overview is given on results demonstrating that photomechanical chemical sensors represent an important development in micromechanical chemical detection technology and can be expected to provide the basis for considerable further development. Microcantilevers with various chemical coatings are shown to respond sensitively to the presence of chemical analytes. Monitoring the bending of microcantilevers provide an attractive alternative to detect gas-phase analytes.

Original language	English
Pages (from-to)	1173-1179
Number of pages	7
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	19
Issue number	4
DOIs	https://doi.org/10.1116/1.1387082
State	Published - Jul 2001
Externally published	Yes
Event	19th North American Conference on Molecular Beam Epitaxy (NAMBE-19) - Tempe, AZ, United States Duration: Oct 15 2000 → Oct 18 2000

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10.1116/1.1387082

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title = "Chemical detection based on adsorption-induced and photoinduced stresses in microelectromechanical systems devices",

abstract = "An overview is given on results demonstrating that photomechanical chemical sensors represent an important development in micromechanical chemical detection technology and can be expected to provide the basis for considerable further development. Microcantilevers with various chemical coatings are shown to respond sensitively to the presence of chemical analytes. Monitoring the bending of microcantilevers provide an attractive alternative to detect gas-phase analytes.",

author = "Datskos, {P. G.} and S. Rajic and Sepaniak, {M. J.} and N. Lavrik and Tipple, {C. A.} and Senesac, {L. R.} and I. Datskou",

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note = "19th North American Conference on Molecular Beam Epitaxy (NAMBE-19) ; Conference date: 15-10-2000 Through 18-10-2000",

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Chemical detection based on adsorption-induced and photoinduced stresses in microelectromechanical systems devices. / Datskos, P. G.; Rajic, S.; Sepaniak, M. J. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 19, No. 4, 07.2001, p. 1173-1179.

Research output: Contribution to journal › Conference article › peer-review

TY - JOUR

T1 - Chemical detection based on adsorption-induced and photoinduced stresses in microelectromechanical systems devices

AU - Datskos, P. G.

AU - Rajic, S.

AU - Sepaniak, M. J.

AU - Lavrik, N.

AU - Tipple, C. A.

AU - Senesac, L. R.

AU - Datskou, I.

PY - 2001/7

Y1 - 2001/7

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AB - An overview is given on results demonstrating that photomechanical chemical sensors represent an important development in micromechanical chemical detection technology and can be expected to provide the basis for considerable further development. Microcantilevers with various chemical coatings are shown to respond sensitively to the presence of chemical analytes. Monitoring the bending of microcantilevers provide an attractive alternative to detect gas-phase analytes.

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DO - 10.1116/1.1387082

M3 - Conference article

AN - SCOPUS:0035535243

SN - 1071-1023

VL - 19

SP - 1173

EP - 1179

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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T2 - 19th North American Conference on Molecular Beam Epitaxy (NAMBE-19)

Y2 - 15 October 2000 through 18 October 2000

ER -

Chemical detection based on adsorption-induced and photoinduced stresses in microelectromechanical systems devices

Abstract

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