Characteristics of BiFeO3 thin films on a LaAlO3 substrate by RF sputtering

Jian Cao; Jie Xing; Bin He; Ziyang Zhang; Yanting Duan; Jiangfan Gu

doi:10.4028/www.scientific.net/AMR.683.64

Characteristics of BiFeO₃ thin films on a LaAlO₃ substrate by RF sputtering

Jian Cao, Jie Xing, Bin He, Ziyang Zhang, Yanting Duan, Jiangfan Gu

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

In this paper, BiFeO₃ (BFO) films were grown on LaAlO₃ (LAO) substrate by a RF magnetron sputtering system. Fabrication parameters, such as work pressure, sputtering atmosphere, and post annealing were examined in terms of their influences on characteristics of the ferroelectric films. X-Ray diffraction, Raman scattering and scanning electron microscope measurements were employed to characterize the microstructure and the morphology of these films. At last, the ferroelectric characteristic of BFO has been studied, and the film has a large saturated polarization of 40 μC/cm² under an applied field of 12 kV /cm.

Original language	English
Title of host publication	Advanced Materials and Engineering Materials II
Pages	64-68
Number of pages	5
DOIs	https://doi.org/10.4028/www.scientific.net/AMR.683.64
State	Published - 2013
Externally published	Yes
Event	2nd International Conference on Advanced Materials and Engineering Materials, ICAMEM 2012 - Shanghai, China Duration: Dec 29 2012 → Dec 30 2012

Publication series

Name	Advanced Materials Research
Volume	683
ISSN (Print)	1022-6680

Conference

Conference	2nd International Conference on Advanced Materials and Engineering Materials, ICAMEM 2012
Country/Territory	China
City	Shanghai
Period	12/29/12 → 12/30/12

Keywords

BiFeO
Ferroelectric
Thin film

Access to Document

10.4028/www.scientific.net/AMR.683.64

Cite this

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title = "Characteristics of BiFeO3 thin films on a LaAlO3 substrate by RF sputtering",

abstract = "In this paper, BiFeO3 (BFO) films were grown on LaAlO3 (LAO) substrate by a RF magnetron sputtering system. Fabrication parameters, such as work pressure, sputtering atmosphere, and post annealing were examined in terms of their influences on characteristics of the ferroelectric films. X-Ray diffraction, Raman scattering and scanning electron microscope measurements were employed to characterize the microstructure and the morphology of these films. At last, the ferroelectric characteristic of BFO has been studied, and the film has a large saturated polarization of 40 μC/cm2 under an applied field of 12 kV /cm.",

keywords = "BiFeO, Ferroelectric, Thin film",

author = "Jian Cao and Jie Xing and Bin He and Ziyang Zhang and Yanting Duan and Jiangfan Gu",

year = "2013",

doi = "10.4028/www.scientific.net/AMR.683.64",

language = "English",

isbn = "9783037856666",

series = "Advanced Materials Research",

pages = "64--68",

booktitle = "Advanced Materials and Engineering Materials II",

note = "2nd International Conference on Advanced Materials and Engineering Materials, ICAMEM 2012 ; Conference date: 29-12-2012 Through 30-12-2012",

}

Cao, J, Xing, J, He, B, Zhang, Z, Duan, Y & Gu, J 2013, Characteristics of BiFeO₃ thin films on a LaAlO₃ substrate by RF sputtering. in Advanced Materials and Engineering Materials II. Advanced Materials Research, vol. 683, pp. 64-68, 2nd International Conference on Advanced Materials and Engineering Materials, ICAMEM 2012, Shanghai, China, 12/29/12. https://doi.org/10.4028/www.scientific.net/AMR.683.64

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T1 - Characteristics of BiFeO3 thin films on a LaAlO3 substrate by RF sputtering

AU - Cao, Jian

AU - Xing, Jie

AU - He, Bin

AU - Zhang, Ziyang

AU - Duan, Yanting

AU - Gu, Jiangfan

PY - 2013

Y1 - 2013

N2 - In this paper, BiFeO3 (BFO) films were grown on LaAlO3 (LAO) substrate by a RF magnetron sputtering system. Fabrication parameters, such as work pressure, sputtering atmosphere, and post annealing were examined in terms of their influences on characteristics of the ferroelectric films. X-Ray diffraction, Raman scattering and scanning electron microscope measurements were employed to characterize the microstructure and the morphology of these films. At last, the ferroelectric characteristic of BFO has been studied, and the film has a large saturated polarization of 40 μC/cm2 under an applied field of 12 kV /cm.

AB - In this paper, BiFeO3 (BFO) films were grown on LaAlO3 (LAO) substrate by a RF magnetron sputtering system. Fabrication parameters, such as work pressure, sputtering atmosphere, and post annealing were examined in terms of their influences on characteristics of the ferroelectric films. X-Ray diffraction, Raman scattering and scanning electron microscope measurements were employed to characterize the microstructure and the morphology of these films. At last, the ferroelectric characteristic of BFO has been studied, and the film has a large saturated polarization of 40 μC/cm2 under an applied field of 12 kV /cm.

KW - BiFeO

KW - Ferroelectric

KW - Thin film

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