Carbon film in RF surface plasma source with cesiation

Vadim Dudnikov; B. Han; S. Murray; T. Pennisi; C. Stinson; M. Stockli; R. Welton; A. Dudnikov

doi:10.1063/1.5053303

Carbon film in RF surface plasma source with cesiation

Vadim Dudnikov, B. Han, S. Murray, T. Pennisi, C. Stinson, M. Stockli, R. Welton, A. Dudnikov

Front End Systems

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

Abstract

Deposition of carbon film in RF SPS is observed. It is assumed that persistent cesiation without continuous cesium injection in the Spallation Neutron Source RF Surface Plasma Source (SPS) is related to deposition of carbon film on the collar converter. The work function dependence for graphite with alkali deposition has no minimum typical for metals and semiconductors and the final work function is higher. For this reason, the probability of H- secondary emission from cesiated metal and semiconductors can be higher than from cesiated carbon films but the carbon film maintains cesiation longer and can operate with low cesium consumption.

Original language	English
Title of host publication	Proceedings of the 17th International Conference on Ion Sources
Editors	Edgar Mahner, Richard Scrivens, Richard Pardo, Jacques Lettry, Bruce Marsh
Publisher	American Institute of Physics Inc.
ISBN (Print)	9780735417274
DOIs	https://doi.org/10.1063/1.5053303
State	Published - Sep 21 2018
Event	17th International Conference on Ion Sources 2018 - Geneva, Switzerland Duration: Sep 15 2017 → Sep 20 2017

Publication series

Name	AIP Conference Proceedings
Volume	2011
ISSN (Print)	0094-243X
ISSN (Electronic)	1551-7616

Conference

Conference	17th International Conference on Ion Sources 2018
Country/Territory	Switzerland
City	Geneva
Period	09/15/17 → 09/20/17

Funding

The work was supported in part by US DOE Contract DE-AC05-00OR22725 and by STTR grant, DE-SC0011323.

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10.1063/1.5053303

Cite this

Dudnikov, V., Han, B., Murray, S., Pennisi, T., Stinson, C., Stockli, M., Welton, R., & Dudnikov, A. (2018). Carbon film in RF surface plasma source with cesiation. In E. Mahner, R. Scrivens, R. Pardo, J. Lettry, & B. Marsh (Eds.), Proceedings of the 17th International Conference on Ion Sources Article 050005 (AIP Conference Proceedings; Vol. 2011). American Institute of Physics Inc.. https://doi.org/10.1063/1.5053303

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title = "Carbon film in RF surface plasma source with cesiation",

abstract = "Deposition of carbon film in RF SPS is observed. It is assumed that persistent cesiation without continuous cesium injection in the Spallation Neutron Source RF Surface Plasma Source (SPS) is related to deposition of carbon film on the collar converter. The work function dependence for graphite with alkali deposition has no minimum typical for metals and semiconductors and the final work function is higher. For this reason, the probability of H- secondary emission from cesiated metal and semiconductors can be higher than from cesiated carbon films but the carbon film maintains cesiation longer and can operate with low cesium consumption.",

author = "Vadim Dudnikov and B. Han and S. Murray and T. Pennisi and C. Stinson and M. Stockli and R. Welton and A. Dudnikov",

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Dudnikov, V, Han, B, Murray, S, Pennisi, T, Stinson, C, Stockli, M, Welton, R & Dudnikov, A 2018, Carbon film in RF surface plasma source with cesiation. in E Mahner, R Scrivens, R Pardo, J Lettry & B Marsh (eds), Proceedings of the 17th International Conference on Ion Sources., 050005, AIP Conference Proceedings, vol. 2011, American Institute of Physics Inc., 17th International Conference on Ion Sources 2018, Geneva, Switzerland, 09/15/17. https://doi.org/10.1063/1.5053303

Carbon film in RF surface plasma source with cesiation. / Dudnikov, Vadim; Han, B.; Murray, S. et al.
Proceedings of the 17th International Conference on Ion Sources. ed. / Edgar Mahner; Richard Scrivens; Richard Pardo; Jacques Lettry; Bruce Marsh. American Institute of Physics Inc., 2018. 050005 (AIP Conference Proceedings; Vol. 2011).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Dudnikov, Vadim

AU - Han, B.

AU - Murray, S.

AU - Pennisi, T.

AU - Stinson, C.

AU - Stockli, M.

AU - Welton, R.

AU - Dudnikov, A.

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N2 - Deposition of carbon film in RF SPS is observed. It is assumed that persistent cesiation without continuous cesium injection in the Spallation Neutron Source RF Surface Plasma Source (SPS) is related to deposition of carbon film on the collar converter. The work function dependence for graphite with alkali deposition has no minimum typical for metals and semiconductors and the final work function is higher. For this reason, the probability of H- secondary emission from cesiated metal and semiconductors can be higher than from cesiated carbon films but the carbon film maintains cesiation longer and can operate with low cesium consumption.

AB - Deposition of carbon film in RF SPS is observed. It is assumed that persistent cesiation without continuous cesium injection in the Spallation Neutron Source RF Surface Plasma Source (SPS) is related to deposition of carbon film on the collar converter. The work function dependence for graphite with alkali deposition has no minimum typical for metals and semiconductors and the final work function is higher. For this reason, the probability of H- secondary emission from cesiated metal and semiconductors can be higher than from cesiated carbon films but the carbon film maintains cesiation longer and can operate with low cesium consumption.

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T2 - 17th International Conference on Ion Sources 2018

Y2 - 15 September 2017 through 20 September 2017

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Carbon film in RF surface plasma source with cesiation

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