Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

G. M. Wright; R. S. Al; E. Alves; L. C. Alves; N. P. Barradas; A. W. Kleyn; N. J. Lopes Cardozo; H. J. van der Meiden; V. Philipps; G. J. van Rooij; A. E. Shumack; W. A.J. Vijvers; J. Westerhout; E. Zoethout; J. Rapp

doi:10.1016/j.jnucmat.2009.11.002

Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

G. M. Wright, R. S. Al, E. Alves, L. C. Alves, N. P. Barradas, A. W. Kleyn, N. J. Lopes Cardozo, H. J. van der Meiden, V. Philipps, G. J. van Rooij, A. E. Shumack, W. A.J. Vijvers, J. Westerhout, E. Zoethout, J. Rapp

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Abstract

Tungsten (W) targets have been exposed to high density (n_e ≤ 4 × 10¹⁹ m^-3), low temperature (T_e ≤ 3 eV) CH₄-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was ∼1220 K at the center and decreased radially to ∼650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with T_e ≥ 2 eV. The maximum film thickness was ∼2.1 μm after a plasma exposure time of 120 s. ³He nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of ∼0.002 in these films deposited at high surface temperatures.

Original language	English
Pages (from-to)	176-180
Number of pages	5
Journal	Journal of Nuclear Materials
Volume	396
Issue number	2-3
DOIs	https://doi.org/10.1016/j.jnucmat.2009.11.002
State	Published - Jan 31 2010
Externally published	Yes

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Wright, G. M., Al, R. S., Alves, E., Alves, L. C., Barradas, N. P., Kleyn, A. W., Lopes Cardozo, N. J., van der Meiden, H. J., Philipps, V., van Rooij, G. J., Shumack, A. E., Vijvers, W. A. J., Westerhout, J., Zoethout, E., & Rapp, J. (2010). Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas. Journal of Nuclear Materials, 396(2-3), 176-180. https://doi.org/10.1016/j.jnucmat.2009.11.002

@article{33cd03e62658486084a7a5a8f8cd8580,

title = "Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas",

abstract = "Tungsten (W) targets have been exposed to high density (ne ≤ 4 × 1019 m-3), low temperature (Te ≤ 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was ∼1220 K at the center and decreased radially to ∼650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with Te ≥ 2 eV. The maximum film thickness was ∼2.1 μm after a plasma exposure time of 120 s. 3He nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of ∼0.002 in these films deposited at high surface temperatures.",

author = "Wright, {G. M.} and Al, {R. S.} and E. Alves and Alves, {L. C.} and Barradas, {N. P.} and Kleyn, {A. W.} and {Lopes Cardozo}, {N. J.} and {van der Meiden}, {H. J.} and V. Philipps and {van Rooij}, {G. J.} and Shumack, {A. E.} and Vijvers, {W. A.J.} and J. Westerhout and E. Zoethout and J. Rapp",

year = "2010",

month = jan,

day = "31",

doi = "10.1016/j.jnucmat.2009.11.002",

language = "English",

volume = "396",

pages = "176--180",

journal = "Journal of Nuclear Materials",

issn = "0022-3115",

publisher = "Elsevier",

number = "2-3",

}

Wright, GM, Al, RS, Alves, E, Alves, LC, Barradas, NP, Kleyn, AW, Lopes Cardozo, NJ, van der Meiden, HJ, Philipps, V, van Rooij, GJ, Shumack, AE, Vijvers, WAJ, Westerhout, J, Zoethout, E & Rapp, J 2010, 'Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas', Journal of Nuclear Materials, vol. 396, no. 2-3, pp. 176-180. https://doi.org/10.1016/j.jnucmat.2009.11.002

TY - JOUR

T1 - Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

AU - Wright, G. M.

AU - Al, R. S.

AU - Alves, E.

AU - Alves, L. C.

AU - Barradas, N. P.

AU - Kleyn, A. W.

AU - Lopes Cardozo, N. J.

AU - van der Meiden, H. J.

AU - Philipps, V.

AU - van Rooij, G. J.

AU - Shumack, A. E.

AU - Vijvers, W. A.J.

AU - Westerhout, J.

AU - Zoethout, E.

AU - Rapp, J.

PY - 2010/1/31

Y1 - 2010/1/31

N2 - Tungsten (W) targets have been exposed to high density (ne ≤ 4 × 1019 m-3), low temperature (Te ≤ 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was ∼1220 K at the center and decreased radially to ∼650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with Te ≥ 2 eV. The maximum film thickness was ∼2.1 μm after a plasma exposure time of 120 s. 3He nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of ∼0.002 in these films deposited at high surface temperatures.

AB - Tungsten (W) targets have been exposed to high density (ne ≤ 4 × 1019 m-3), low temperature (Te ≤ 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was ∼1220 K at the center and decreased radially to ∼650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with Te ≥ 2 eV. The maximum film thickness was ∼2.1 μm after a plasma exposure time of 120 s. 3He nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of ∼0.002 in these films deposited at high surface temperatures.

UR - http://www.scopus.com/inward/record.url?scp=73549115636&partnerID=8YFLogxK

U2 - 10.1016/j.jnucmat.2009.11.002

DO - 10.1016/j.jnucmat.2009.11.002

M3 - Article

AN - SCOPUS:73549115636

SN - 0022-3115

VL - 396

SP - 176

EP - 180

JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

IS - 2-3

ER -

Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

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