C-V characteristics of Pt/SrBi2Ta2O9/CeO2/Si structure for non-volatile memory devices

Ho N. Lee, Dong Suk Shin, Yong Tae Kim, Sung Ho Choh

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Electrical properties of Pt/SrBi2Ta2O9/CeO2/Si structure have been investigated for the ferroelectric gate of non-volatile memory. Memory windows of the ferroelectric gate are in the range of 1∼2V corresponding to the thickness of SrBi2Ta2O9 films at the applied voltage of 6V. This memory window is strongly dependent upon not the remanent polarization but the coercive field intensity applied to the SrBi2Ta2O9.

Original languageEnglish
Title of host publicationEuropean Solid-State Device Research Conference
EditorsH. Grunbacher
PublisherIEEE Computer Society
Pages756-759
Number of pages4
ISBN (Electronic)2863322214
DOIs
StatePublished - 1997
Externally publishedYes
Event27th European Solid-State Device Research Conference, ESSDERC 1997 - Stuttgart, Germany
Duration: Sep 22 1997Sep 24 1997

Publication series

NameEuropean Solid-State Device Research Conference
ISSN (Print)1930-8876

Conference

Conference27th European Solid-State Device Research Conference, ESSDERC 1997
Country/TerritoryGermany
CityStuttgart
Period09/22/9709/24/97

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