Boronization in DIII-D

G. L. Jackson, J. Winter, K. H. Burrell, J. C. DeBoo, C. M. Greenfield, R. J. Groebner, T. Hodapp, K. Holtrop, A. G. Kellman, R. Lee, S. I. Lippmann, R. Moyer, J. Phillips, T. S. Taylor, J. Watkins, W. P. West

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Abstract

A thin boron film has been applied to the DIII-D tokamak plasma facing surfaces to reduce impurity influx, particularly oxygen and carbon. A direct result of this surface modification was the observation of a regime of very high energy confinement, VH-mode, with confinement times from 1.5 to 2 times greater than predicted by the H-mode scaling relation for the same set of parameters. VH-mode discharges are characterized by low ohmic target densities, low edge neutral pressure, and reduced recycling. These conditions have reduced the collisionality ν* in the edge region producing a higher edge pressure gradient and a significant bootstrap current, up to 30% of the total current. We will describe the edge plasma properties after boronization including reductions in recycling inferred from measurements of τp*. In particular we will discuss the edge plasma conditions necessary for access to VH-mode including the boronization process and properties of the deposited film.

Original languageEnglish
Pages (from-to)236-240
Number of pages5
JournalJournal of Nuclear Materials
Volume196-198
Issue numberC
DOIs
StatePublished - Dec 1 1992
Externally publishedYes

Funding

This work was supported by the US Department of Energy under Contract no. DE-AC03-89ER51114.

FundersFunder number
US Department of Energy

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