Bias assisted scanning probe microscopy direct write lithography enables local oxygen enrichment of lanthanum cuprates thin films

Francesco Lavini; Nan Yang; Rama K. Vasudevan; E. Strelcov; S. Jesse; M. B. Okatan; I. Kravchenko; Daniele Di Castro; Sergei V. Kalinin; Giuseppe Balestrino; Carmela Aruta; Vittorio Foglietti

doi:10.1088/0957-4484/26/32/325302

Bias assisted scanning probe microscopy direct write lithography enables local oxygen enrichment of lanthanum cuprates thin films

Francesco Lavini, Nan Yang, Rama K. Vasudevan, E. Strelcov, S. Jesse, M. B. Okatan, I. Kravchenko, Daniele Di Castro, Sergei V. Kalinin, Giuseppe Balestrino, Carmela Aruta, Vittorio Foglietti

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Scanning probe bias techniques have been used as a method to locally dope thin epitaxial films of La₂CuO₄ (LCO) fabricated by pulsed laser deposition. The local electrochemical oxidation of LCO very efficiently introduces interstitial oxygen defects in the thin film. Details on the influence of the tip voltage bias and environmental conditions on the surface morphology have been investigated. The results show that a local uptake of oxygen occurs in the oxidized films.

Original language	English
Article number	325302
Journal	Nanotechnology
Volume	26
Issue number	32
DOIs	https://doi.org/10.1088/0957-4484/26/32/325302
State	Published - Aug 14 2015

Bibliographical note

Publisher Copyright:
© 2015 IOP Publishing Ltd.

Keywords

AFM lithography
surface electrochemical processes
tip-induced local oxidation

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Lavini, F., Yang, N., Vasudevan, R. K., Strelcov, E., Jesse, S., Okatan, M. B., Kravchenko, I., Di Castro, D., Kalinin, S. V., Balestrino, G., Aruta, C., & Foglietti, V. (2015). Bias assisted scanning probe microscopy direct write lithography enables local oxygen enrichment of lanthanum cuprates thin films. Nanotechnology, 26(32), Article 325302. https://doi.org/10.1088/0957-4484/26/32/325302

@article{a19dddabfa5841d5bd8a62e5f5dc2719,

title = "Bias assisted scanning probe microscopy direct write lithography enables local oxygen enrichment of lanthanum cuprates thin films",

abstract = "Scanning probe bias techniques have been used as a method to locally dope thin epitaxial films of La2CuO4 (LCO) fabricated by pulsed laser deposition. The local electrochemical oxidation of LCO very efficiently introduces interstitial oxygen defects in the thin film. Details on the influence of the tip voltage bias and environmental conditions on the surface morphology have been investigated. The results show that a local uptake of oxygen occurs in the oxidized films.",

keywords = "AFM lithography, surface electrochemical processes, tip-induced local oxidation",

author = "Francesco Lavini and Nan Yang and Vasudevan, {Rama K.} and E. Strelcov and S. Jesse and Okatan, {M. B.} and I. Kravchenko and {Di Castro}, Daniele and Kalinin, {Sergei V.} and Giuseppe Balestrino and Carmela Aruta and Vittorio Foglietti",

note = "Publisher Copyright: {\textcopyright} 2015 IOP Publishing Ltd.",

year = "2015",

month = aug,

day = "14",

doi = "10.1088/0957-4484/26/32/325302",

language = "English",

volume = "26",

journal = "Nanotechnology",

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Lavini, F, Yang, N, Vasudevan, RK, Strelcov, E, Jesse, S, Okatan, MB, Kravchenko, I, Di Castro, D, Kalinin, SV, Balestrino, G, Aruta, C & Foglietti, V 2015, 'Bias assisted scanning probe microscopy direct write lithography enables local oxygen enrichment of lanthanum cuprates thin films', Nanotechnology, vol. 26, no. 32, 325302. https://doi.org/10.1088/0957-4484/26/32/325302

TY - JOUR

T1 - Bias assisted scanning probe microscopy direct write lithography enables local oxygen enrichment of lanthanum cuprates thin films

AU - Lavini, Francesco

AU - Yang, Nan

AU - Vasudevan, Rama K.

AU - Strelcov, E.

AU - Jesse, S.

AU - Okatan, M. B.

AU - Kravchenko, I.

AU - Di Castro, Daniele

AU - Kalinin, Sergei V.

AU - Balestrino, Giuseppe

AU - Aruta, Carmela

AU - Foglietti, Vittorio

PY - 2015/8/14

Y1 - 2015/8/14

N2 - Scanning probe bias techniques have been used as a method to locally dope thin epitaxial films of La2CuO4 (LCO) fabricated by pulsed laser deposition. The local electrochemical oxidation of LCO very efficiently introduces interstitial oxygen defects in the thin film. Details on the influence of the tip voltage bias and environmental conditions on the surface morphology have been investigated. The results show that a local uptake of oxygen occurs in the oxidized films.

AB - Scanning probe bias techniques have been used as a method to locally dope thin epitaxial films of La2CuO4 (LCO) fabricated by pulsed laser deposition. The local electrochemical oxidation of LCO very efficiently introduces interstitial oxygen defects in the thin film. Details on the influence of the tip voltage bias and environmental conditions on the surface morphology have been investigated. The results show that a local uptake of oxygen occurs in the oxidized films.

KW - AFM lithography

KW - surface electrochemical processes

KW - tip-induced local oxidation

UR - http://www.scopus.com/inward/record.url?scp=84938117687&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/26/32/325302

DO - 10.1088/0957-4484/26/32/325302

M3 - Article

AN - SCOPUS:84938117687

SN - 0957-4484

VL - 26

JO - Nanotechnology

JF - Nanotechnology

IS - 32

M1 - 325302

ER -

Bias assisted scanning probe microscopy direct write lithography enables local oxygen enrichment of lanthanum cuprates thin films

Abstract

Bibliographical note

Keywords

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