Bayesian optimization for stable properties amid processing fluctuations in sputter deposition

Ankit Shrivastava, Matias Kalaswad, Joyce O. Custer, David P. Adams, Habib N. Najm

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

We introduce a Bayesian optimization approach to guide the sputter deposition of molybdenum thin films, aiming to achieve desired residual stress and sheet resistance while minimizing susceptibility to stochastic fluctuations during deposition. Thin films are pivotal in numerous technologies, including semiconductors and optical devices, where their properties are critical. Sputter deposition parameters, such as deposition power, vacuum chamber pressure, and working distance, influence physical properties like residual stress and resistance. Excessive stress and high resistance can impair device performance, necessitating the selection of optimal process parameters. Furthermore, these parameters should ensure the consistency and reliability of thin film properties, assisting in the reproducibility of the devices. However, exploring the multidimensional design space for process optimization is expensive. Bayesian optimization is ideal for optimizing inputs/parameters of general black-box functions without reliance on gradient information. We utilize Bayesian optimization to optimize deposition power and pressure using a custom-built objective function incorporating observed stress and resistance data. Additionally, we integrate prior knowledge of stress variation with pressure into the objective function to prioritize films least affected by stochastic variations. Our findings demonstrate that Bayesian optimization effectively explores the design space and identifies optimal parameter combinations meeting desired stress and resistance specifications.

Original languageEnglish
Article number033408
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume42
Issue number3
DOIs
StatePublished - May 1 2024
Externally publishedYes

Funding

The authors acknowledge funding under the Beyond Fingerprinting Sandia Grand Challenge Laboratory Directed Research and Development (GC LDRD) program. Sandia National Laboratories is a multi-mission laboratory managed and operated by National Technology & Engineering Solutions of Sandia, LLC (NTESS), a wholly owned subsidiary of Honeywell International Inc., for the U.S. Department of Energy\u2019s National Nuclear Security Administration (DOE/NNSA) under Contract No. DE-NA0003525. This written work is authored by an employee of NTESS. The employee, not NTESS, owns the right, title, and interest in and to the written work and is responsible for its contents. Any subjective views or opinions that might be expressed in the written work do not necessarily represent the views of the U.S. Government. The publisher acknowledges that the U.S. Government retains a non-exclusive, paid-up, irrevocable, world-wide license to publish or reproduce the published form of this written work or allow others to do so, for U.S. Government purposes. The DOE will provide public access to results of federally sponsored research in accordance with the DOE Public Access Plan.

Fingerprint

Dive into the research topics of 'Bayesian optimization for stable properties amid processing fluctuations in sputter deposition'. Together they form a unique fingerprint.

Cite this