Abstract
As device geometries shrink to 0.25 micron and smaller, all facets of integrated circuit (IC) processing are being challenged. With device sizes shrinking, so too shrinks the size of a defect that can cause chip failure, and hence yield loss. Contamination free manufacturing practices are becoming critical for successful device fabrication. To accomplish this, elimination of defect sources has a high priority. A defect can be a particle, microcontamination, pattern anomaly, crystalline defect such as a stacking fault, and so on. Defects have become a main source of yield loss to the semiconductor industry. This comes at a time when 90% yield values on mature product cannot increase at the rate that has occurred in the past. The industry is now faced with finding methods of incremental yield increase, in-line, on production wafers. Automatic Defect Classification (ADC) is an important part of SEMATECH's strategy to meet these industry needs.
Original language | English |
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Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
Publisher | Society of Photo-Optical Instrumentation Engineers |
Pages | 210-220 |
Number of pages | 11 |
Volume | 2439 |
ISBN (Print) | 0819417874, 9780819417879 |
DOIs | |
State | Published - 1995 |
Externally published | Yes |
Event | Integrated Circuit Metrology, Inspection, and Process Control IX - Santa Clara, CA, USA Duration: Feb 20 1995 → Feb 22 1995 |
Conference
Conference | Integrated Circuit Metrology, Inspection, and Process Control IX |
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City | Santa Clara, CA, USA |
Period | 02/20/95 → 02/22/95 |