Atomically thin half-van der Waals metals enabled by confinement heteroepitaxy

  • Natalie Briggs
  • , Brian Bersch
  • , Yuanxi Wang
  • , Jue Jiang
  • , Roland J. Koch
  • , Nadire Nayir
  • , Ke Wang
  • , Marek Kolmer
  • , Wonhee Ko
  • , Ana De La Fuente Duran
  • , Shruti Subramanian
  • , Chengye Dong
  • , Jeffrey Shallenberger
  • , Mingming Fu
  • , Qiang Zou
  • , Ya Wen Chuang
  • , Zheng Gai
  • , An Ping Li
  • , Aaron Bostwick
  • , Chris Jozwiak
  • Cui Zu Chang, Eli Rotenberg, Jun Zhu, Adri C.T. van Duin, Vincent Crespi, Joshua A. Robinson

Research output: Contribution to journalArticlepeer-review

167 Scopus citations

Abstract

Atomically thin two-dimensional (2D) metals may be key ingredients in next-generation quantum and optoelectronic devices. However, 2D metals must be stabilized against environmental degradation and integrated into heterostructure devices at the wafer scale. The high-energy interface between silicon carbide and epitaxial graphene provides an intriguing framework for stabilizing a diverse range of 2D metals. Here we demonstrate large-area, environmentally stable, single-crystal 2D gallium, indium and tin that are stabilized at the interface of epitaxial graphene and silicon carbide. The 2D metals are covalently bonded to SiC below but present a non-bonded interface to the graphene overlayer; that is, they are ‘half van der Waals’ metals with strong internal gradients in bonding character. These non-centrosymmetric 2D metals offer compelling opportunities for superconducting devices, topological phenomena and advanced optoelectronic properties. For example, the reported 2D Ga is a superconductor that combines six strongly coupled Ga-derived electron pockets with a large nearly free-electron Fermi surface that closely approaches the Dirac points of the graphene overlayer.

Original languageEnglish
Pages (from-to)637-643
Number of pages7
JournalNature Materials
Volume19
Issue number6
DOIs
StatePublished - Jun 1 2020

Funding

Funding for this work was provided by the Northrop Grumman Mission Systems’ University Research Program, Semiconductor Research Corporation Intel/Global Research Collaboration Fellowship Program, task 2741.001, National Science Foundation (NSF) CAREER Awards 1453924 and 1847811, the Chinese Scholarship Council, an Alfred P. Sloan Research Fellowship, NSF DMR-1708972 and 1808900, and the 2D Crystal Consortium NSF Materials Innovation Platform under cooperative agreement DMR-1539916. A portion of this research was conducted at the Center for Nanophase Materials Sciences, which is a DOE Office of Science User Facility, and at the Pennsylvania State University Materials Research Institute’s Material Characterization Laboratory. This research used resources of the Advanced Light Source, which is a DOE Office of Science User Facility under contract no. DE-AC02-05CH11231. We acknowledge Haiying Wang for help with STEM sample cross-section preparation via FIB; Vince Bojan, Nabil Bassim and Heshem Elsherif for help with AES; and Max Wetherington for Raman spectroscopy support.

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