Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
- Daming Wei
- , James H. Edgar
- , Dayrl P. Briggs
- , Scott T. Retterer
- , Bernadeta Srijanto
- , Dale K. Hensley
- , Harry M. Meyer
Research output: Contribution to journal › Article › peer-review
6
Scopus
citations