Atomic layer deposition of TiO2 on mesoporous silica

Shannon Mahurin, Lili Bao, Wenfu Yan, Chengdu Liang, Sheng Dai

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44 Scopus citations

Abstract

Ultra-thin layers of titanium dioxide are conformally grown within the pores of an ordered mesoporous silica, SBA-15, using atomic layer deposition, reducing the pore size from the original value of 67 Å to a final value of 32 Å. Analysis of the nitrogen isotherms indicated a conformal growth process in which both the internal surface area of the mesoporous material and the external surface was coated.

Original languageEnglish
Pages (from-to)3280-3284
Number of pages5
JournalJournal of Non-Crystalline Solids
Volume352
Issue number30-31
DOIs
StatePublished - Sep 1 2006

Funding

This work was conducted at the Oak Ridge National Laboratory and supported by the Division of Chemical Sciences, Office of Basic Energy Sciences, US Department of Energy, under contract no. DE-AC05-00OR22725 with UT-Battelle, LLC. This research was supported in part by appointments for S.M., L.B., and W.Y. to the Oak Ridge National Laboratory Postdoctoral Research Associates Program administered jointly by the Oak Ridge Institute for Science and Education and Oak Ridge National Laboratory.

Keywords

  • Porosity
  • Sol-gels (xerogels)
  • Zeolites

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