Atomic layer deposition of l -alanine polypeptide

Yaqin Fu, Binsong Li, Ying Bing Jiang, Darren R. Dunphy, Andy Tsai, Siu Yue Tam, Hongyou Fan, Hongxia Zhang, David Rogers, Susan Rempe, Plamen Atanassov, Joseph L. Cecchi, C. Jeffrey Brinker

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

l-Alanine polypeptide thin films were synthesized via atomic layer deposition (ALD). Instead of using an amino acid monomer as the precursor, an l-alanine amino acid derivatized with a protecting group was used to prevent self-polymerization, increase the vapor pressure, and allow linear cycle-by-cycle growth emblematic of ALD. The successful deposition of a conformal polypeptide film has been confirmed by FTIR, TEM, and Mass Spectrometry, and the ALD process has been extended to polyvaline.

Original languageEnglish
Pages (from-to)15821-15824
Number of pages4
JournalJournal of the American Chemical Society
Volume136
Issue number45
DOIs
StatePublished - Nov 12 2014
Externally publishedYes

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