Atomic layer-by-layer surface removal by force microscopy

T. Thundat, B. C. Sales, B. C. Chakoumakos, L. A. Boatner, D. P. Allison, R. J. Warmack

Research output: Contribution to journalArticlepeer-review

Abstract

Using an atomic force microscope (AFM) operating under ambient conditions, we have obtained the first atomic resolution AFM images of atomic-scale defects and have observed the scanning induced removal of atoms from lead pyrophosphate cleavage faces. Repeated scanning of the same surface area revealed cyclic changes in the Pb2P2O7 atomic structure consistent with a layer-by-layer removal of atoms. Subsequent large area imaging of a region that had been subjected to repeated scanning revealed a depression several nanometers deep, including that this technique may be applicable to patterning the surfaces of materials on an atomic scale.

Original languageEnglish
Pages (from-to)L857-L862
JournalSurface Science Letters
Volume293
Issue number1-2
DOIs
StatePublished - Aug 10 1993

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