Atomic layer-by-layer surface removal by force microscopy

T. Thundat; B. C. Sales; B. C. Chakoumakos; L. A. Boatner; D. P. Allison; R. J. Warmack

doi:10.1016/0039-6028(93)90236-D

Atomic layer-by-layer surface removal by force microscopy

T. Thundat, B. C. Sales, B. C. Chakoumakos, L. A. Boatner, D. P. Allison, R. J. Warmack

Single Crystal Diffraction

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Abstract

Using an atomic force microscope (AFM) operating under ambient conditions, we have obtained the first atomic resolution AFM images of atomic-scale defects and have observed the scanning induced removal of atoms from lead pyrophosphate cleavage faces. Repeated scanning of the same surface area revealed cyclic changes in the Pb₂P₂O₇ atomic structure consistent with a layer-by-layer removal of atoms. Subsequent large area imaging of a region that had been subjected to repeated scanning revealed a depression several nanometers deep, indicating that this technique may be applicable to patterning the surfaces of materials on an atomic scale.

Original language	English
Pages (from-to)	L863-L869
Journal	Surface Science
Volume	293
Issue number	1-2
DOIs	https://doi.org/10.1016/0039-6028(93)90236-D
State	Published - Aug 10 1993

Funding

l Research sponsored by the Division of Materials Sciences, US Department of Energy under contract no. DE-ACOS-840R21400 with Martin Marietta Energy Systems, Inc. * To whom correspondence should be addressed. The authors are grateful to W.G. Oliver for valuabled iscussionsT. his work was supportedb y the Director’s Research and DevelopmentF und at the Oak Ridge National Laboratory and by both the Office of Health and Environmental Research and the Division of Materials Sciences, US Department of Energy under contract no. DE-AC05-840R21400 with Martin Marietta Energy Systems,In c.

Funders	Funder number
Division of Materials Sciences
Office of Health and Environmental Research
U.S. Department of Energy	DE-ACOS-840R21400, DE-AC05-840R21400
Oak Ridge National Laboratory

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10.1016/0039-6028(93)90236-D

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AU - Sales, B. C.

AU - Chakoumakos, B. C.

AU - Boatner, L. A.

AU - Allison, D. P.

AU - Warmack, R. J.

PY - 1993/8/10

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AB - Using an atomic force microscope (AFM) operating under ambient conditions, we have obtained the first atomic resolution AFM images of atomic-scale defects and have observed the scanning induced removal of atoms from lead pyrophosphate cleavage faces. Repeated scanning of the same surface area revealed cyclic changes in the Pb2P2O7 atomic structure consistent with a layer-by-layer removal of atoms. Subsequent large area imaging of a region that had been subjected to repeated scanning revealed a depression several nanometers deep, indicating that this technique may be applicable to patterning the surfaces of materials on an atomic scale.

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Atomic layer-by-layer surface removal by force microscopy

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