Artifact-free sample preparation of metal thin films using Xe plasma-focused ion beam milling for atomic resolution and in situ biasing analyses

Hee Beom Lee, Seon Je Kim, Min Hyoung Jung, Young Hoon Kim, Su Jae Kim, Hai Feng Gao, Brandon Van Leer, Se Young Jeong, Hu Young Jeong, Young Min Kim

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The focused ion beam (FIB) technique using Ga ion beams is generally employed for transmission electron microscopy (TEM) sampling owing to its location-specific beam controllability on materials. However, Ga ion beam bombardment-induced damage hinders reliable structural analysis. Furthermore, Ga ions implanted in the damaged surface layer substantially lower the chemical stability of the samples, such as metal thin films. Here, aiming for atomic-level interface structural analysis, we propose a useful approach for the TEM sample preparation of heteroepitaxial Ag/Cu metal films without physical damage or chemical instabilities using the Xe plasma FIB (PFIB) system. Xe plasma-assisted sampling ensured that the interface structure of the Ag/Cu metal film remained intact; in contrast, the sample prepared using the focused Ga ion beam was damaged by elemental mixing. Furthermore, the sample prepared by Xe plasma milling exhibited robust structural stability over time after exposure to air in contrast to the sample prepared by Ga-ion milling, which induced structural decomposition owing to oxidation. In addition to the static structural analysis, the Cu thin film sample prepared by Xe PFIB exclusively exhibited pristine structural properties under in situ electrical biasing experiments, thus confirming the feasibility of conducting a fundamental study of Cu electromigration without artifacts.

Original languageEnglish
Article number114260
JournalMaterials Characterization
Volume216
DOIs
StatePublished - Oct 2024
Externally publishedYes

Funding

This work was supported by the Samsung Research Funding & Incubation Center of Samsung Electronics under Project Number SRFC-MA2202-02 and the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by Ministry of Science and ICT (2023R1A2C2002403). H.Y.J. acknowledges support from the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (2022R1A2C2011109).

Keywords

  • Focused ion beam milling
  • Interface structure
  • Metal thin film
  • Transmission electron microscopy
  • Xe plasma

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