Application of optical emission spectroscopy for the SNS H - ion source plasma studies

B. X. Han, M. P. Stockli, R. F. Welton, S. N. Murray, T. R. Pennisi, M. Santana

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

10 Scopus citations

Abstract

The SNS H - ion source is a dual-frequency RF-driven (13.56-MHz low power continuous RF superimposed by 2-MHz high power pulsed RF with ∼1.0 ms pulse length at 60 Hz), Cs-enhanced ion source. This paper discusses the applications of optical emission spectroscopy for the ion source plasma conditioning, cesiation, failure diagnostics, and studies of plasma build-up and outage issues.

Original languageEnglish
Title of host publication4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014
EditorsWerner Kraus, Paul McNeely
PublisherAmerican Institute of Physics Inc.
ISBN (Electronic)9780735412972
DOIs
StatePublished - Apr 8 2015
Externally publishedYes
Event4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014 - Garching, Germany
Duration: Oct 6 2014Oct 10 2014

Publication series

NameAIP Conference Proceedings
Volume1655
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014
Country/TerritoryGermany
CityGarching
Period10/6/1410/10/14

Bibliographical note

Publisher Copyright:
© 2015 AIP Publishing LLC.

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