Application of optical emission spectroscopy for the SNS H                         -                          ion source plasma studies

B. X. Han; M. P. Stockli; R. F. Welton; S. N. Murray; T. R. Pennisi; M. Santana

doi:10.1063/1.4916430

Application of optical emission spectroscopy for the SNS H ^- ion source plasma studies

B. X. Han, M. P. Stockli, R. F. Welton, S. N. Murray, T. R. Pennisi, M. Santana

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

10 Scopus citations

Abstract

The SNS H ^- ion source is a dual-frequency RF-driven (13.56-MHz low power continuous RF superimposed by 2-MHz high power pulsed RF with ∼1.0 ms pulse length at 60 Hz), Cs-enhanced ion source. This paper discusses the applications of optical emission spectroscopy for the ion source plasma conditioning, cesiation, failure diagnostics, and studies of plasma build-up and outage issues.

Original language	English
Title of host publication	4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014
Editors	Werner Kraus, Paul McNeely
Publisher	American Institute of Physics Inc.
ISBN (Electronic)	9780735412972
DOIs	https://doi.org/10.1063/1.4916430
State	Published - Apr 8 2015
Externally published	Yes
Event	4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014 - Garching, Germany Duration: Oct 6 2014 → Oct 10 2014

Publication series

Name	AIP Conference Proceedings
Volume	1655
ISSN (Print)	0094-243X
ISSN (Electronic)	1551-7616

Conference

Conference	4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014
Country/Territory	Germany
City	Garching
Period	10/6/14 → 10/10/14

Access to Document

10.1063/1.4916430

Cite this

Han, B. X., Stockli, M. P., Welton, R. F., Murray, S. N., Pennisi, T. R., & Santana, M. (2015). Application of optical emission spectroscopy for the SNS H ^- ion source plasma studies In W. Kraus, & P. McNeely (Eds.), 4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014 Article 030003 (AIP Conference Proceedings; Vol. 1655). American Institute of Physics Inc.. https://doi.org/10.1063/1.4916430

Han, B. X. ; Stockli, M. P. ; Welton, R. F. et al. / Application of optical emission spectroscopy for the SNS H ^- ion source plasma studies 4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014. editor / Werner Kraus ; Paul McNeely. American Institute of Physics Inc., 2015. (AIP Conference Proceedings).

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abstract = " The SNS H - ion source is a dual-frequency RF-driven (13.56-MHz low power continuous RF superimposed by 2-MHz high power pulsed RF with ∼1.0 ms pulse length at 60 Hz), Cs-enhanced ion source. This paper discusses the applications of optical emission spectroscopy for the ion source plasma conditioning, cesiation, failure diagnostics, and studies of plasma build-up and outage issues.",

author = "Han, {B. X.} and Stockli, {M. P.} and Welton, {R. F.} and Murray, {S. N.} and Pennisi, {T. R.} and M. Santana",

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Han, BX, Stockli, MP, Welton, RF, Murray, SN, Pennisi, TR & Santana, M 2015, Application of optical emission spectroscopy for the SNS H ^- ion source plasma studies in W Kraus & P McNeely (eds), 4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014., 030003, AIP Conference Proceedings, vol. 1655, American Institute of Physics Inc., 4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014, Garching, Germany, 10/6/14. https://doi.org/10.1063/1.4916430

Application of optical emission spectroscopy for the SNS H ^- ion source plasma studies . / Han, B. X.; Stockli, M. P.; Welton, R. F. et al.
4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014. ed. / Werner Kraus; Paul McNeely. American Institute of Physics Inc., 2015. 030003 (AIP Conference Proceedings; Vol. 1655).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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Han BX, Stockli MP, Welton RF, Murray SN, Pennisi TR, Santana M. Application of optical emission spectroscopy for the SNS H ^- ion source plasma studies In Kraus W, McNeely P, editors, 4th International Symposium on Negative Ions, Beams and Sources, NIBS 2014. American Institute of Physics Inc. 2015. 030003. (AIP Conference Proceedings). doi: 10.1063/1.4916430