Application of MeV ion implantation in the formation of nano-metallic clusters in silica

D. Ila; Z. Wu; R. L. Zimmerman; S. Sarkisov; C. C. Smith; D. B. Poker; D. K. Hensley

Application of MeV ion implantation in the formation of nano-metallic clusters in silica

D. Ila, Z. Wu, R. L. Zimmerman, S. Sarkisov, C. C. Smith, D. B. Poker, D. K. Hensley

Research output: Contribution to journal › Conference article › peer-review

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Abstract

The implementation of metal ions into photorefractive materials followed by thermal annealing leads to an increase in resonance optical absorption as well as an enhancement of the nonlinear optical properties. We have implanted ions of Au (3.6 MeV), Ag (1.5 MeV) and Cu (2.0 MeV) into pure silica followed by careful heat treatment. Using optical absorption spectrophotometry and rutherford backscattering spectrometry we have measured the cluster size for each heat treatment temperature and determined the activation energies for their formation. The third order electric susceptibility for silica with 2 nm gold clusters has been determined by Z-scan to be 65×10^-8 esu.

Original language	English
Pages (from-to)	143-147
Number of pages	5
Journal	Materials Research Society Symposium - Proceedings
Volume	457
State	Published - 1997
Externally published	Yes
Event	Proceedings of the 1996 MRS Fall Symposium - Boston, MA, USA Duration: Dec 2 1996 → Dec 5 1996

Cite this

@article{882812a474694d638164c4ffa25217b2,

title = "Application of MeV ion implantation in the formation of nano-metallic clusters in silica",

abstract = "The implementation of metal ions into photorefractive materials followed by thermal annealing leads to an increase in resonance optical absorption as well as an enhancement of the nonlinear optical properties. We have implanted ions of Au (3.6 MeV), Ag (1.5 MeV) and Cu (2.0 MeV) into pure silica followed by careful heat treatment. Using optical absorption spectrophotometry and rutherford backscattering spectrometry we have measured the cluster size for each heat treatment temperature and determined the activation energies for their formation. The third order electric susceptibility for silica with 2 nm gold clusters has been determined by Z-scan to be 65×10-8 esu.",

author = "D. Ila and Z. Wu and Zimmerman, {R. L.} and S. Sarkisov and Smith, {C. C.} and Poker, {D. B.} and Hensley, {D. K.}",

year = "1997",

language = "English",

volume = "457",

pages = "143--147",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

note = "Proceedings of the 1996 MRS Fall Symposium ; Conference date: 02-12-1996 Through 05-12-1996",

}

TY - JOUR

T1 - Application of MeV ion implantation in the formation of nano-metallic clusters in silica

AU - Ila, D.

AU - Wu, Z.

AU - Zimmerman, R. L.

AU - Sarkisov, S.

AU - Smith, C. C.

AU - Poker, D. B.

AU - Hensley, D. K.

PY - 1997

Y1 - 1997

N2 - The implementation of metal ions into photorefractive materials followed by thermal annealing leads to an increase in resonance optical absorption as well as an enhancement of the nonlinear optical properties. We have implanted ions of Au (3.6 MeV), Ag (1.5 MeV) and Cu (2.0 MeV) into pure silica followed by careful heat treatment. Using optical absorption spectrophotometry and rutherford backscattering spectrometry we have measured the cluster size for each heat treatment temperature and determined the activation energies for their formation. The third order electric susceptibility for silica with 2 nm gold clusters has been determined by Z-scan to be 65×10-8 esu.

AB - The implementation of metal ions into photorefractive materials followed by thermal annealing leads to an increase in resonance optical absorption as well as an enhancement of the nonlinear optical properties. We have implanted ions of Au (3.6 MeV), Ag (1.5 MeV) and Cu (2.0 MeV) into pure silica followed by careful heat treatment. Using optical absorption spectrophotometry and rutherford backscattering spectrometry we have measured the cluster size for each heat treatment temperature and determined the activation energies for their formation. The third order electric susceptibility for silica with 2 nm gold clusters has been determined by Z-scan to be 65×10-8 esu.

UR - http://www.scopus.com/inward/record.url?scp=0030643322&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0030643322

SN - 0272-9172

VL - 457

SP - 143

EP - 147

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1996 MRS Fall Symposium

Y2 - 2 December 1996 through 5 December 1996

ER -

Application of MeV ion implantation in the formation of nano-metallic clusters in silica

Abstract

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