TY - JOUR
T1 - Analytical study of statistical error in coupled finite-volume/Monte Carlo simulations of the plasma edge
AU - Baeten, M.
AU - Ghoos, K.
AU - Baelmans, M.
AU - Samaey, G.
N1 - Publisher Copyright:
© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2018/7/1
Y1 - 2018/7/1
N2 - Plasma and neutral transport in the plasma edge region of magnetic confinement fusion devices is often simulated by iteratively coupling a finite volume (FV) code for the plasma with a Monte Carlo (MC) code for the neutral particles. Because of the statistical MC noise, the iterative scheme defines a Markov process for the plasma states. We derived relations between the iterative scheme and the statistical distribution of the plasma states. In this paper, we study in detail, for random noise coupling and in a generalized scalar setting, the relation between the artificial time step used in the iterative scheme and the variance of the plasma states. We show numerically that our new insights, gained from the scalar setting, still hold when simulating a simplified 1D plasma edge model.
AB - Plasma and neutral transport in the plasma edge region of magnetic confinement fusion devices is often simulated by iteratively coupling a finite volume (FV) code for the plasma with a Monte Carlo (MC) code for the neutral particles. Because of the statistical MC noise, the iterative scheme defines a Markov process for the plasma states. We derived relations between the iterative scheme and the statistical distribution of the plasma states. In this paper, we study in detail, for random noise coupling and in a generalized scalar setting, the relation between the artificial time step used in the iterative scheme and the variance of the plasma states. We show numerically that our new insights, gained from the scalar setting, still hold when simulating a simplified 1D plasma edge model.
KW - Markov process
KW - plasma edge simulation
KW - pseudo-transient continuation
KW - statistical error analysis
UR - http://www.scopus.com/inward/record.url?scp=85053005206&partnerID=8YFLogxK
U2 - 10.1002/ctpp.201700177
DO - 10.1002/ctpp.201700177
M3 - Article
AN - SCOPUS:85053005206
SN - 0863-1042
VL - 58
SP - 659
EP - 665
JO - Contributions to Plasma Physics
JF - Contributions to Plasma Physics
IS - 6-8
ER -